Depositing layers in OLED devices using viscous flow

ABSTRACT

A method of depositing a patterned organic layer includes providing a manifold and an OLED display substrate in a chamber at reduced pressure and spaced relative to each other; providing a structure sealingly covering at least one surface of the manifold, the structure including a plurality of nozzles extending through the structure into the manifold. The method also includes delivering vaporized organic materials into the manifold, and applying an inert gas under pressure into the manifold so that the inert gas provides a viscous gas flow through each of the nozzles, such viscous gas flow transporting at least portions of the vaporized organic materials from the manifold through the nozzles to provide directed beams of the inert gas and of the vaporized organic materials and projecting the directed beams onto the OLED display substrate for depositing a pattern of an organic layer on the substrate.

CROSS REFERENCE TO RELATED APPLICATIONS

[0001] Reference is made to commonly assigned U.S. patent applicationSer. No. ______ filed ______ by Michael A. Marcus et al., entitled“Device for Depositing Patterned Layers in OLED Displays”, thedisclosure of which is herein incorporated by reference.

FIELD OF THE INVENTION

[0002] The present invention relates to forming patterned organic layersin making a multicolor OLED display or full-color OLED display, and moreparticularly to vapor depositing such patterned layers without requiringprecision shadow masks.

BACKGROUND OF THE INVENTION

[0003] An organic light-emitting diode (OLED) device, also referred toas an organic electroluminescent device, can be constructed bysandwiching two or more organic layers between first and secondelectrodes.

[0004] In single-color OLED devices or displays, also called monochromeOLEDs, these organic layers are not patterned but are formed ascontinuous layers.

[0005] In multicolor OLED devices or displays or in full-color OLEDdisplays, an organic hole-injecting and hole-transporting layer isformed as a continuous layer over and between the first electrodes. Apattern of one or more laterally adjacent organic light-emitting layersare then formed over the continuous hole-injecting and hole-transportinglayer. This pattern, and the organic materials used to form the pattern,is selected to provide multicolor or full-color light-emission from acompleted and operative OLED display in response to electrical potentialsignals applied between the first and second electrodes.

[0006] An unpatterned organic electron-injecting andelectron-transporting layer is formed over the patterned light-emittinglayers, and one or more second electrodes are provided over this latterorganic layer.

[0007] Providing a patterned organic light-emitting layer capable ofemitting light of two different colors (multicolor) or of threedifferent colors, for example, the primary colors of red (R), green (G),and blue (B), is also referred to as color pixelation since the patternis aligned with pixels of an OLED display. The RGB pattern provides afull-color OLED display.

[0008] Various processes have been proposed to achieve color pixelationin OLED imaging panels. For example, Tang et al. in commonly assignedU.S. Pat. No. 5,294,869 discloses a process for the fabrication of amulticolor OLED imaging panel using a shadow masking method in whichsets of pillars or walls made of electrically insulative materials forman integral part of the device structure. A multicolor organicelectroluminescent (“EL”) medium is vapor deposited and patterned bycontrolling an angular position of a substrate with respect to adeposition vapor stream. The complexity of this process resides in therequirements that the integral shadow mask have multilevel topologicalfeatures, which may be difficult to produce, and that angularpositioning of the substrate with respect to one or more vapor sourcesmust be controlled.

[0009] Littman et al. in commonly assigned U.S. Pat. No. 5,688,551recognized the complexity of the above described Tang et al. process,and discloses a method of forming a multicolor organic EL display panelin which a close-spaced deposition technique is used to form aseparately colored organic EL medium on a substrate by patternwisetransferring the organic EL medium from a donor sheet to the substrate.The donor sheet includes a radiation-absorbing layer which can beunpatterned or which can be prepatterned in correspondence with apattern of pixels or subpixels on the substrate. The donor sheet has tobe positioned either in direct contact with a surface of the substrateor at a controlled relatively small distance from the substrate surfaceto minimize the undesirable effect of divergence of the EL medium vaporsissuing from the donor sheet upon heating the radiation-absorbing layer.

[0010] In general, positioning an element such as, for example, a donorsheet or a mask, in direct contact with a surface of a substrate caninvite problems of abrasion, distortion, or partial lifting of arelatively thin and mechanically fragile organic layer which has beenformed previously on the substrate surface. For example, an organichole-injecting and hole-transporting layer may be formed over thesubstrate prior to deposition of a first-color pattern. In depositing asecond-color pattern, direct contact of a donor sheet or a mask with thefirst-color pattern may cause abrasion, distortion, or partial liftingof the first-color pattern.

[0011] Positioning a donor sheet or a mask at a controlled distance fromthe substrate surface may require incorporation of spacer elements onthe substrate, or on the donor sheet or the mask, or on the substrateand on the donor sheet. Alternatively, special fixtures may have to bedevised to provide for a controlled spacing between the substratesurface and a donor sheet or a mask.

[0012] The potential problems or constraints also apply to disclosuresby Grande et al. in commonly assigned U.S. Pat. No. 5,871,709 whichdescribes a method for patterning high-resolution organic EL displays,as well as to teachings by Nagayama et al. in U.S. Pat. No. 5,742,129which discloses the use of shadow masking in manufacturing an organic ELdisplay panel.

[0013] The above described potential problems or constraints areovercome by disclosures of Tang et al. in commonly assigned U.S. Pat.No. 6,066,357 which teaches methods of making a full-color OLED display.The methods include ink-jet printing of fluorescent dopants selected toproduce red, green, or blue light emission from designated subpixels ofthe display. The dopants are printed sequentially from ink-jet printingcompositions which permit printing of dopant layers over an organiclight-emitting layer containing a host material selected to provide hostlight emission in a blue spectral region. The dopants are diffused fromthe dopant layer into the light-emitting layer.

[0014] The ink-jet printing of dopants does not require masks, andsurfaces of ink-jet print heads are not contacting a surface of theorganic light-emitting layer. However, the ink-jet printing of dopantsis performed under ambient conditions in which oxygen and moisture inthe ambient air can result in partial oxidative decomposition of theuniformly deposited organic light-emitting layer containing the hostmaterial. Additionally, direct diffusion of a dopant, or subsequentdiffusion of a dopant, into the light-emitting layer can cause partialswelling and attendant distortion of the domains of the light-emittinglayer into which the dopant was diffused.

[0015] OLED imaging displays can be constructed in the form of so-calledpassive matrix devices or in the form of so-called active matrixdevices.

[0016] In a passive matrix OLED display of conventional construction, aplurality of laterally spaced light-transmissive anodes, for example,indium-tin-oxide (ITO) anodes are formed as first electrodes on alight-transmissive substrate such as, for example, a glass substrate.Three or more organic layers are then formed successively by vapordeposition of respective organic materials from respective vaporsources, within a chamber held at reduced pressure, typically less than10⁻³ Torr (1.33×10⁻¹ Pa). A plurality of laterally spaced cathodes isdeposited as second electrodes over an uppermost one of the organiclayers. The cathodes are oriented at an angle, typically at a rightangle, with respect to the anodes.

[0017] Such conventional passive matrix OLED displays are operated byapplying an electrical potential (also referred to as a drive voltage)between an individual row (cathode) and, sequentially, each column(anode). When a cathode is biased negatively with respect to an anode,light is emitted from a pixel defined by an overlap area of the cathodeand the anode, and emitted light reaches an observer through the anodeand the substrate.

[0018] In an active matrix OLED display, an array of sets of thin-filmtransistors (TFTs) is provided on a light-transmissive substrate suchas, for example, a glass substrate. One TFT, respectively, of each ofthe sets of TFTs is connected to a corresponding light-transmissiveanode pad, which can be made, for example, of indium-tin-oxide (ITO).Three or more organic layers are then formed successively by vapordeposition in a manner substantially equivalent to the construction ofthe aforementioned passive matrix OLED display. A common cathode isdeposited as a second electrode over an uppermost one of the organiclayers. The construction and function of an active matrix OLED displayis described in commonly assigned U.S. Pat. No. 5,550,066.

[0019] In order to provide a multicolor or a full-color (red, green, andblue subpixels) passive matrix or active matrix OLED display, colorpixelation of at least portions of an organic light-emitting layer isrequired.

[0020] Color pixelation of OLED displays can be achieved through variousmethods as detailed above. One of the most common current methods ofcolor pixelation integrates the use of one or more of the describedvapor sources and a precision shadow mask temporarily fixed in referenceto a device substrate. Organic light-emitting material, such as thatused to create an OLED emitting layer, is sublimed from a source (orfrom multiple sources) and deposited on the OLED substrate through theopen areas of the aligned precision shadow mask. This physical vapordeposition (PVD) for OLED production is achieved in vacuum through theuse of a heated vapor source containing vaporizable organic OLEDmaterial. The organic material in the vapor source is heated to attainsufficient vapor pressure to effect efficient sublimation of the organicmaterial, creating a vaporous organic material plume that travels to anddeposits on an OLED substrate. A variety of vapor sources based ondifferent operating principles exist, including the so-called pointsources (heated small sublimation cross-sectional area sources) andlinear sources (sources of large sublimation cross-sectional area).Multiple mask-substrate alignments and vapor depositions are used todeposit a pattern of differing light-emitting layers on desiredsubstrate pixel areas or subpixel areas creating, for example, a desiredpattern of red, green, and blue pixels or subpixels on an OLEDsubstrate. Note that in this method which is commonly used in OLEDproduction not all of the vaporized material present in the vaporousmaterial plume is deposited onto desired areas of the substrate. Insteadmuch of the material plume is deposited onto various vacuum chamberwalls, shielding, and precision shadow masks. This leads to poormaterial utilization factors and consequently high materials cost.

[0021] While precision shadow masking is a feasible method for OLEDproduction, it also effects many complications and potentialpredicaments to display manufacturing. First, care must be taken inpositioning and removing these masks onto and from a device substrate toavoid physical damage to OLED devices. Second, when vacuum depositinglarge area substrates it is difficult to keep shadow masks in intimatecontact at all places along the length of the substrate, which can leadto unfocussed depositions or mask induced substrate physical damage.Third, when vacuum depositing three colored regions at differentlocations on the substrate, three sets of precision shadow masks may beneeded and can cause unwanted delays in OLED production. Fourth, keepingmask to substrate precision alignment with the required accuracy alongthe length of large substrates is very difficult for several reasons,including mask and substrate thermal expansion mismatches, small pixelpitches, and mask fabrication limitations. Also, when vacuum depositingmultiple substrates during a single vacuum pump down cycle, materialresidue can build up on shadow masks and can eventually cause defects toform in the pixels being deposited.

SUMMARY OF THE INVENTION

[0022] It is an object of the present invention to provide a method ofcolor pixelating an organic layer in making a multicolor or a full-colororganic electroluminescent (EL) display.

[0023] It is another object of the present invention to provide a methodof depositing in a pattern an organic layer onto an OLED displaysubstrate.

[0024] It is a further object of the present invention to provide amethod of color pixelating an organic layer which overcomes theconstraints of prior art and of currently used methods of colorpixelation in making a multicolor or a full-color organicelectroluminescent (EL) display.

[0025] In one aspect, these objects are achieved by a method ofdepositing in a pattern an organic layer onto an OLED display substrate,comprising the steps of:

[0026] a) providing a manifold and an OLED display substrate in achamber at reduced pressure and spaced relative to each other;

[0027] b) providing a structure sealingly covering one surface of themanifold, the structure including a plurality of nozzles extendingthrough the structure into the manifold, and the nozzles being spacedfrom each other in correspondence with the pattern to be deposited ontothe OLED display substrate;

[0028] c) orienting the OLED display substrate with respect to thenozzles in the structure;

[0029] d) delivering vaporized organic materials into the manifold; and

[0030] e) applying an inert gas under pressure into the manifold so thatthe inert gas provides a viscous gas flow through each of the nozzles,such viscous gas flow transporting at least portions of the vaporizedorganic materials from the manifold through the nozzles to providedirected beams of the inert gas and of the vaporized organic materialsand projecting the directed beams onto the OLED display substrate fordepositing a pattern of an organic layer on the substrate.

[0031] In another aspect, these objects are achieved by a method ofconcurrently depositing in a three-color pattern an organic layer ontoan OLED display substrate, comprising the steps of:

[0032] a) providing a manifold assembly and an OLED display substrate ina chamber at reduced pressure and spaced relative to each other, themanifold assembly including a first manifold, a second manifold, and athird manifold;

[0033] b) providing a separate structure sealingly covering one surfaceof each one of the first, second, and third manifolds, each separatestructure including a plurality of nozzles extending through eachstructure into a corresponding manifold, and the nozzles in eachseparate structure being spaced from each other in correspondence withthe three-color pattern to be deposited onto the OLED display substrate;

[0034] c) orienting the OLED display substrate with respect to thenozzles in one of the separate structures;

[0035] d) delivering concurrently first-color forming vaporized organicmaterials into the first manifold, second-color forming vaporizedorganic materials into the second manifold, and third-color formingvaporized organic materials into the third manifold assembly; and

[0036] e) applying an inert gas under pressure concurrently into eachone of the first, second, and third manifolds so that the inert gasprovides a viscous gas flow through each of the plurality of nozzles ineach of the separate structures, such viscous gas flow transportingconcurrently at least portions of the first-color forming, second-colorforming, and third-color forming vaporized organic materials from arespectively corresponding manifold through corresponding nozzles toprovide directed beams of the inert gas and of the first-color forming,second-color forming, and third-color forming vaporized organiclight-emitting materials and projecting the directed beams onto the OLEDdisplay substrate for concurrently depositing a three-color pattern onthe substrate.

[0037] In a still further aspect, the present invention is directed to amethod of depositing in a pattern vaporized material onto a surface,comprising the steps of:

[0038] a) providing vaporized material in a manifold of reducedpressure;

[0039] b) providing a structure sealingly covering one surface of themanifold, the structure including a plurality of nozzles extendingthrough the structure into the manifold, and the nozzles being spacedfrom each other in correspondence with the pattern to be deposited ontothe surface; and

[0040] c) applying an inert gas under pressure into the manifold so thatthe inert gas provides a viscous gas flow through each of the nozzles,such viscous gas flow transporting at least portions of the vaporizedmaterial from the manifold through the nozzles to provide directed beamsof the inert gas and of the vaporized material and projecting thedirected beams onto the surface upon which deposition is desired.

ADVANTAGES

[0041] A feature of the present invention is that the method of colorpixelating an organic layer uses directed vapor beams of organicmaterials.

[0042] Another feature of the present invention is that the method ofcolor pixelating an organic layer is effected in a chamber at reducedpressure and in the presence of an inert gas.

[0043] Another feature of the present invention is that the method ofcolor pixelating an organic layer permits concurrent three-colorpatternwise deposition onto an OLED display substrate.

[0044] Another feature of the present invention is that the method ofcolor pixelating an organic layer includes providing a plurality ofvapor sources disposed outside of a deposition chamber for generatingvapors of organic materials, and connecting such vapor sources to amanifold disposed in the chamber.

[0045] Another feature of the present invention is that the method ofcolor pixelating does not require the use of precision shadowmasks ormasking.

[0046] Another feature of the present invention is that it enables thepotential to coat mixtures of many different materials in a singledeposited layer.

[0047] Another feature of the present invention is that the method ofdeposition allows very high material utilization factors, as allsublimed material is directed and deposited directly onto the desiredpixel areas on the substrate.

BRIEF DESCRIPTION OF THE DRAWINGS

[0048]FIG. 1 is a schematic perspective view of a passive matrix OLEDdisplay having partially peeled-back elements to reveal various layers;

[0049]FIG. 2 is a schematic perspective view of an OLED apparatussuitable for making a relatively large number of OLED displays andhaving a plurality of stations extending from hubs;

[0050]FIG. 3 is a schematic section view of a carrier containing arelatively large number of substrates or structures, and positioned in aload station of the apparatus of FIG. 2 as indicated by section lines3-3 in FIG. 2;

[0051]FIG. 4 is a schematic top view of a full-color (RGB) passivematrix OLED display that can be color pixelated by the method of thepresent invention;

[0052]FIG. 5 is a schematic sectional view of the OLED display, takenalong the section lines 5-5 of FIG. 4;

[0053]FIG. 6 is a circuit diagram of repeating units of a portion of anactive matrix OLED display;

[0054]FIG. 7 is a schematic sectional view of an active matrix OLEDdisplay having RGB color pixelation of the light-emitting layer whichcan be formed by the method of the present invention;

[0055]FIG. 8 is a schematic rendition of a vapor deposition apparatus bywhich the present invention can be practiced, and including a chamber inwhich are disposed a substrate and a manifold having a structure ornozzle plate covering the manifold and including nozzles for producingdirected vapor beams, and a plurality of vapor sources and an inert gassupply disposed outside of the chamber and connected to the manifold;

[0056]FIG. 9 shows a structure or nozzle plate having nozzles arrangedalong a center line;

[0057]FIG. 10 is a sectional view of the nozzle plate, taken along lines10-10 of FIG. 9, and defining a nozzle length dimension and a nozzleinside dimension;

[0058]FIG. 11 shows a nozzle plate having a two-dimensional array ofnozzles arranged in rows and columns;

[0059]FIG. 12 is a schematic top view of a cylindrical tubular manifoldhaving nozzles arranged along a center line;

[0060]FIG. 13 is a sectional view of the cylindrical tubular manifold,taken along section lines 13-13 of FIG. 12, and defining a nozzle lengthdimension and a nozzle inside dimension;

[0061]FIG. 13A is a sectional view of a modified cylindrical tubularmanifold having a curved nozzle plate disposed over a slit-shapedaperture formed in a cylindrical manifold housing;

[0062]FIG. 14 indicates schematically a relationship between divergenceof an organic material vapor stream issuing from a nozzle over amanifold and, respectively, a vapor pressure in the manifold and thevapor pressure plus inert gas pressure levels in the manifold;

[0063]FIG. 15 is a sectional view of an embodiment of a vapor sourcesuch as the vapor sources shown schematically in FIG. 8;

[0064]FIG. 16 is a schematic sectional view of the LEL vapor depositionstation of FIG. 2, and indicating motion of the substrate from a firstposition, over and past the nozzles, and into a second position;

[0065]FIG. 17 is a schematic top view of a portion of the LEL vapordeposition station of FIG. 2, and showing alignment features on thenozzle plate and on the substrate holder, and an indexing feature ofindexing the substrate in a y-direction prior to each substrate motionin an x-direction over and past the nozzles; and

[0066]FIG. 18 shows schematically a manifold assembly, which is usefulfor concurrent color pixelation of an RGB full-color organiclight-emitting layer in a single pass of a substrate over and past thenozzles in the assembly.

DETAILED DESCRIPTION OF THE INVENTION

[0067] The drawings are necessarily of a schematic nature since layerthickness dimensions of OLEDs are frequently in the sub-micrometerranges, while features representing lateral device dimensions can be ina range of 25-2000 millimeter. Furthermore, the plurality of nozzlesformed in the nozzle plate(s) or structure(s) is relatively small insize when compared to a length dimension over which the nozzles extend.Accordingly, the drawings are scaled for ease of visualization ratherthan for dimensional accuracy.

[0068] The term “display” or “display panel” is employed to designate ascreen capable of electronically displaying video images or text. Theterm “pixel” is employed in its art-recognized usage to designate anarea of a display panel that can be stimulated to emit lightindependently of other areas. The term “multicolor” is employed todescribe a display panel that is capable of emitting light of adifferent hue in different areas. In particular, it is employed todescribe a display panel that is capable of displaying images ofdifferent colors. These areas are not necessarily contiguous. The term“full color” is employed to describe multicolor display panels that arecapable of emitting in the red, green, and blue regions of the visiblespectrum and displaying images in any combination of hues. The red,green, and blue colors constitute the three primary colors from whichall other colors can be generated by appropriately mixing these threeprimaries. The term “hue” refers to the intensity profile of lightemission within the visible spectrum, with different hues exhibitingvisually discernible differences in color. The pixel or subpixel isgenerally used to designate the smallest addressable unit in a displaypanel. For a monochrome display, there is no distinction between pixelor subpixel. The term “subpixel” is used in multicolor display panelsand is employed to designate any portion of a pixel that can beindependently addressable to emit a specific color. For example, a bluesubpixel is that portion of a pixel that can be addressed to emit bluelight. In a full-color display, a pixel generally comprises threeprimary color subpixels, namely red, green, and blue, frequentlyabbreviated to “RGB”. The term “pitch” is used to designate the distanceseparating two pixels or subpixels in a display panel. Thus, a subpixelpitch means the separation between two subpixels. The term “inert gas”denotes a gas, which is chemically non-reactive toward organic vaporsand toward organic layers formed on OLED display substrates.

[0069] Turning to FIG. 1, a schematic perspective view of a passivematrix OLED display 10 is shown having partially peeled-back elements toreveal various layers.

[0070] A light-transmissive substrate 11 has formed thereon a pluralityof laterally spaced first electrodes 12 (also referred to as anodes). Anorganic hole-transporting layer (HTL) 13, an organic light-emittinglayer (LEL) 14, and an organic electron-transporting layer (ETL) 15 areformed in sequence by a physical vapor deposition, as will be describedin more detail hereinafter. A plurality of laterally spaced secondelectrodes 16 (also referred to as cathodes) are formed over the organicelectron-transporting layer 15, and in a direction substantiallyperpendicular to the first electrodes 12. An encapsulation or cover 18seals environmentally sensitive portions of the device, therebyproviding a completed OLED 10.

[0071] Turning to FIG. 2, a schematic perspective view of an OLEDapparatus 100 is shown which is suitable for making a relatively largenumber of organic light-emitting devices or displays using automated orrobotic means (not shown) for transporting or transferring substratesamong a plurality of stations extending from a buffer hub 102 and from atransfer hub 104. A vacuum pump 106 via a pumping port 107 providesreduced pressure within the hubs 102, 104, and within each of thestations extending from these hubs, except for station 140. A pressuregauge 108 indicates the reduced pressure within the apparatus 100. Thepressure is typically lower than 10⁻³ Torr (1.33×10⁻¹ Pascal) and can beas low as 10⁻⁶ Torr (1.33×10⁻⁴ Pascal).

[0072] The stations include a load station 110 for providing a load ofsubstrates, a vapor deposition station 130 dedicated to forming organichole-transporting layers (HTL) which may include organic hole-injectingsub-layers, a vapor deposition station 140 dedicated to forming organiclight-emitting layers (LEL), a vapor deposition station 150 dedicated toforming organic electron-transporting layers (ETL), a vapor depositionstation 160 dedicated to forming the plurality of second electrodes(cathodes), an unload station 103 for transferring substrates from thebuffer hub 102 to the transfer hub 104 which, in turn, provides astorage station 170, and an encapsulation station 180 connected to thehub 104 via a connector port 105. Each of these stations, except for LELstation 140, has an open port extending into the hubs 102 and 104,respectively, and each station has a vacuum-sealed access port (notshown) to provide access to a station for cleaning, and for replacementor repair of parts. Each station includes a housing, which defines achamber.

[0073] The inventive method of color pixelating organic layers in makingan OLED display uses directed beams which are generated by inducingviscous flow of an inert gas through nozzles, the viscous gas flowtransporting with it vapors of organic materials. Depending on thenumber and inside dimensions of the nozzles, as well as the gas flowrequired to achieve directed beams, the “gas loading” of LEL station 140can be relatively high. Such relatively high “gas loading” couldadversely affect the functioning of other stations of the OLED apparatus100.

[0074] In order to prevent such potentially adverse effects on otherstations and hubs of the OLED apparatus 100, the LEL station 140 isadapted to isolate this station during color pixelation. Isolation isachieved by: (i) a station valve 141, shown in dashed outline proximatethe buffer hub 102, is normally in a closed position. Station valve 141is opened only to permit transfer of a substrate from the buffer hubinto station 140, and again to transfer a completed substrate, i.e. acolor pixelated substrate, from station 140 into the buffer hub 102; and(ii) a station vacuum pump 142 is connected to station 140 via a stationpumping port 144 which includes a throttle valve 145. The throttle valvecan be controlled to be in a fully open position, throttled to apartially open position, or to be in a closed position. A stationpressure sensor 146 indicates the pressure within a chamber of station140.

[0075] Prior to substrate transfer(s) the throttle valve 145 is adjustedso that substantially identical pressure indications are obtained fromstation pressure sensor 146 and from pressure gauge 108 of the OLEDapparatus 100, and the station valve 141 can then be opened.

[0076] Upon transfer of a substrate from the hub 102 into the chamber(140C) of station 140, the station valve 141 is closed and the throttlevalve 145 is opened to provide for evacuation of the chamber (140C) toan initial pressure in a range from 10⁻⁷ to 10⁻⁵ Torr (1.33×10⁻⁵ to1.33×10⁻³ Pa) in order to remove traces of oxygen and moisture from thechamber.

[0077] Prior to color pixelation, inert gas may optionally be admittedinto the chamber (140C) from an inert gas supply 147 via a conduit 148including a gas flow controller 149. The throttle valve 145 is throttledto a position so that the gas pressure (P_(c)) in the chamberequilibrates to a selected level in a range from about 10⁻⁷ to 10⁰ Torr.The gas pressure level in the chamber is lower than the pressure of aninert gas, which is used to cause viscous flow in the nozzles (506) toprovide the directed beams.

[0078]FIG. 3 is a schematic section view of the load station 110, takenalong section lines 3-3 of FIG. 2. The load station 110 has a housing110H, which defines a chamber 110C. Within the chamber is positioned acarrier 111 designed to carry a plurality of substrates 11 havingpreformed first electrodes 12 (see FIG. 1 and FIGS. 4-5). An alternativecarrier 111 can be provided for supporting a plurality of active matrixsubstrates 51 (see FIG. 7). Carriers 111 can also be provided in theunload station 103 and in the storage station 170.

[0079] Turning to FIG. 4, a schematic top view of a full-color (RGB)passive matrix OLED display 10-3C is shown which can be color pixelatedby the method of the present invention. Like numeral designationscorrespond like parts or functions given in the description of FIG. 1.Each pixel (labeled pix in FIG. 4) comprises three adjacent subpixels,labeled R, G, and B. Each subpixel is formed at the intersection of acolumn electrode or anode 12 and a row electrode or cathode 16. Eachsubpixel can be addressed independently to emit a specific color. Forexample, a subpixel labeled R has an organic EL medium, which emits redlight. Likewise, the subpixels labeled G and B have organic EL media,which emit green and blue light, respectively. Each pixel, therefore,has three independently addressable column electrodes 12 (anodes) andone addressable row electrode 16, and the OLED display 10-3C has threetimes as many column electrodes or anodes 12 as row electrodes orcathodes 16. Note that a simple column stripe pattern is shown in FIG.4, but more complicated pixel patterns such as the commonly used deltapattern, is also possible.

[0080]FIG. 4 shows a limited number of pixels (pixes). In principle, thenumber of pixels is limited only by the size of the substrate 11 uponwhich the display 10-3C is fabricated. The pixel resolution, or thenumber density of pixels can be made quite high, limited only by theresolution of the patterning method to produce color pixelation. Usingthe directed beam deposition of the present invention can permit pixelresolution as high as 50 pixels per millimeter.

[0081] In one type of OLED display, commonly called a bottom emittingdisplay, a selected pattern of light emission from the OLED display10-3C is produced which can be observed by viewing the bottom surface ofthe light-transmissive substrate 11. In a preferred mode of operation,the panel is stimulated to emit light by sequentially stimulating onerow of pixels at a time and repeating the stimulating sequence at a ratechosen so that the interval between repeated stimulation of each row isless than the detection limit of the human visual system, typically lessthan about {fraction (1/60)}^(th) of a second. An observer sees an imageformed by emission from all stimulated rows, even though the panel atany instant in time is emitting light from addressed subpixels in onlyone row.

[0082] The RGB color pixelation of the OLED panel 10-3C is shown as astripe pattern in which each of the R, G, and B stripes produces lightemission only from areas defined by the intersection of a columnelectrode (anode) 12 and a row electrode (cathode) 16 when stimulated,even though the definition of a pixel pix includes the non-emitting gaps(not labeled in FIG. 4) between the anodes 12.

[0083]FIG. 5 is a schematic sectional view of the OLED display, takenalong the section lines 5-5 of FIG. 4. The EL medium includes an organichole-transporting layer 13 formed as a continuous layer over and betweenthe anode column electrodes 12 which are provided on the substrate 11.The hole-transporting layer can include a hole-injecting sublayer (notshown) formed first over and between the anodes. Organic light-emittingsubpixel layers 14R, 14G, and 14B are formed over the hole-transportinglayer. An organic electron-transporting layer 15 is formed as acontinuous layer over the color pixelated layers, and can include anoverlaying electron-injecting layer (not shown) in contact with thecathode row electrode(s) 16.

[0084] Turning to FIG. 6, a circuit diagram of a portion of an activematrix OLED display is depicted. Each one of repeating subpixel circuitsincludes a thin-film switching transistor TSnm where n, m are integerswhich define the specific location of the subpixel circuit formed on alight-transmissive substrate 51 (see FIG. 7). For example, TS12 is athin-film switching transistor associated with a subpixel circuitlocated in a row 1 and in a position 2 or a column 2 of that row. Eachsubpixel circuit further includes a thin-film transistor TCnm for powercontrol, a thin-film capacitor Cnm, and an organic EL medium ELnm whichare depicted as diodes. Power supply lines Vddn, X-direction signallines (including lines X1 to Xn, where n is an integer), and Y-directionsignal lines (including lines Y1 to Ym, where m is an integer) provideelectrical potentials and signal addressing capability, respectively, toeach subpixel circuit. Circuits in row 1, defined by signal addressinglines X1 and Y1-Y3, are indicated as 61-1, 61-2, and 61-3, respectively,and like numeral designations are used in FIG. 7. The X-directionsignals lines X1, X2, X3, . . . Xn are connected to an X-directiondriving circuit 87, and the Y-direction signals lines Y1, Y2, Y3, . . .Ym are connected to a Y-direction driving circuit 88. To provide lightemission, for example, from the EL medium EL 12, signals are provided atX-direction signal line X1 and at Y-direction signal line Y2, therebyactuating the thin-film switching transistor TS12 into an “on” state. Inturn, the thin-film transistor for power control TC12 comes into an “on”state and induces electric current flow through the EL medium EL12provided via the power supply line Vdd1. Thus, light is emitted by theOLED EL12. Why here

[0085]FIG. 7 is a schematic sectional view of the portion of subpixels61-1, 61-2, and 61-3 indicated in FIG. 6, and showing a full-colorpixelated EL medium in which RGB color pixelation of the light-emittinglayer is designated at 54R, 54G, and 54B, respectively. Color pixelationcan be achieved by the method of the invention.

[0086] On a light-transmissive substrate 51 are provided the subpixelcircuit elements (thin-film transistors, thin-film capacitor, andelectrical wiring) 61-1, 61-2, and 61-3. Conductive wiring 64 providesan electrical connection (from a thin-film transistor for power control)to a light-transmissive first electrode or anode pad 52 which can beconstructed of indium-tin-oxide (ITO). A light-transmissive organicinsulator layer 66 provides electrical insulation. A second organicinsulator layer 68 encases edges and portions of upper surfaces of thepads 52.

[0087] The organic EL medium is then formed, comprised of, in sequence,a continuous organic hole-injecting and hole-transporting layer 53, thecolor pixelated organic light-emitting layers 54R, 54G, and 54B, and acontinuous electron-transporting layer 55. A common second electrode orcathode 56 is formed in contact with the electron-transporting layer 55.Effective dimensions of light emission from subpixels are indicated byarrows extending between dashed lines, while a pixel pix includes notonly these light emission portions but also non-emissive raised portionswhich extend between the recessed light emission portions 54R, 54G, and54B.

[0088] Turning to FIG. 8, a schematic rendition of a vapor depositionapparatus 500 is shown which is useful in practicing the presentinvention. The station 140 of FIG. 2 has a housing 140H which defines achamber 140C which is held at a reduced pressure P_(c) as described withreference to FIG. 2. In order to preserve clarity of the drawing, thestation valve 141, the station vacuum pump 142 and associated pumpingport 144 and throttle valve 145, the station pressure sensor 146, aswell as the inert gas supply 147 with conduits 148 and gas flowcontroller 149, have been omitted in FIG. 8. Moreover, depending on thematerial in the substrate 11 (51), manifold-to-substrate spacing anddeposition temperatures, the substrate may have to be cooled and, forconvenience of illustration, a cooling structure has also not beenshown.

[0089] Disposed in the chamber 140C is a manifold 500M which includes amanifold housing 502 which is sealingly covered on at least one surfaceby a structure which is also referred to as a nozzle plate 504. Thenozzle plate has a plurality of nozzles 506, which extend into themanifold. The structure or nozzle plate has alignment marks 533 formedon one surface which serve to align an OLED display substrate 11 (51)with respect to the nozzles prior to vapor depositing the first one of acolor pixelated organic light-emitting layer 14R, 14G, or 14B as astripe pattern on the substrate. It is understood that the substrate 11(51) includes an organic hole-injecting and hole-transporting layer(HTL) 13 or 53.

[0090] Upon aligning a substrate in the chamber 140C in a y-directionwith respect to the nozzles 506 via the alignment marks 533 andalignment windows 233 provided on a holder or mask frame 230 in which asubstrate is positioned (see FIGS. 16 and 17), the substrate 11 (51) ismoved in an x-direction to a starting position “I” by a lead screw 212(see FIGS. 16 and 17). It will be understood that either the substrate11 (51) or the manifold 500M can be moved. Of course, deposition canalso be accomplished if either of these elements is stationary.

[0091] A plurality of organic material vapor sources 500VS1 to 500VS4 isshown disposed outside of the chamber 140C. In order to coat alight-emitting layer at least one of the materials in vapor sources500VS1 to 500VS4 would be a light-emitting material. Alternatively thesaid plurality or organic material vapor sources 500VS1 to 500 VS4 couldbe disposed inside of the chamber 140C and/or inside of manifold 500M.Each vapor source includes a housing 540. As depicted schematically inFIG. 8 and described in greater detail with reference to FIG. 15, thehousing 540 includes a flange 541 which sealingly mates with a sourcecover 544 and which, in turn, is sealingly attached to a lower vaportransport conduit 546 a. A vapor flow control device 560 v is connectedat one termination to the lower vapor transport conduit 546 a, and at asecond termination to an upper vapor transport conduit 546 b. Each vaporsource 500VS1 to 500VS4 also preferably includes an individual heatingelement not shown in FIG. 8 for heating the material inside to anappropriate temperature to create a vapor of that organic materialplaced within the vapor source. Alternatively the said organic materialcan be loaded directly into manifold 500M without the use of separatesaid vapor sources 500VS1 to 500VS4, and organic vapor created throughthe use of a heating element (not pictured) placed directly on or in themanifold 500M.

[0092] An inert gas supply 500IGS has a gas shut-off valve 562 and aconduit (not identified in the drawing) leading from the gas shut-offvalve into an inert gas preheater 564 for heating the gas to atemperature sufficient to prevent condensation of organic materialvapors on inner surfaces of elements in which both the inert gas flowand flow of an organic material vapor are present. A lower gas transportconduit 566 a connects the inert gas preheater to one termination of agas flow control device 560 g, and an upper gas transport conduit 566 bconnects a second termination of the gas flow control device 560 g to acombiner 570. The combiner 570 also accepts the upper vapor transportconduits 546 b, and combines inert gas flow and at least a portion oforganic material vapor from two organic material vapor sources which areoperative concurrently, as will be described further hereinafter. Acommon conduit 546 c for vapor transport and gas transport connects anoutput termination of the combiner 570 to the manifold 500M through thehousing 140H of the vapor deposition station 140. Alternatively, inertgas could be fed directly into the manifold 500M and mixed with organicvapor that has been transported or generated there.

[0093] The organic material vapor sources, the inert gas preheater, theflow control devices, the combiner, and the transport conduits arearranged within a heatable enclosure 600 shown in dashed outline. Theheatable enclosure can be an appropriately sized and configuredlaboratory oven which can be controllably heated to provide atemperature T_(c) within the enclosure sufficient to preventcondensation of organic material vapors on inside surfaces of the vaporsources, conduits, vapor flow control devices, and the combiner 570.

[0094] Likewise, to prevent condensation of organic material vapors oninner surfaces of the manifold 500M and the surface of the structure ornozzle plate 504 facing the manifold, and to prevent clogging of thenozzles 506 by vapor condensation, the manifold can be heated bymanifold heating lamps 520. Not shown in FIG. 8 is a controllableheating lamp power supply and electrical connections to the heatinglamps 520. It will be appreciated that, for example, heating coils orheating strips can be used equally effectively in heating the manifoldand the nozzle plate.

[0095] It has been found unexpectedly that highly directed beams of gaswith a very small angular divergence from the nozzle axis will exit fromthe nozzles 506 if gas flow is controlled by the gas flow control device560 g such that a resulting gas pressure in the manifold 500M causesviscous flow of the gas from the manifold through the nozzles and intothe chamber 140C. It has also been found that organic material vaporscan be combined with flowing inert gas in the combiner 570 to betransported into the manifold 500M, and to issue from the nozzles 506 ascombined directed beams 510 of organic material vapors and inert gas. Ithas also been established for directed gas beams, that collimation canbe retained over a distance in a range from about 0.02 to 2.0 centimeterabove the structure or nozzle plate 504 depending on an insidedimensions of the nozzles and on a level of gas flow into the manifoldwith corresponding increase of gas pressure therein.

[0096] Alternatively it has also been found that that highly directedbeams of gas with a very small angular divergence from the nozzle axiswill exit from the nozzles 506 if gas flow is controlled by the gas flowcontrol device 560 g such that a resulting gas pressure in the manifold500M causes viscous flow of the gas from the manifold through thenozzles and into the chamber 140C when the said organic material isvaporized directly in said manifold 500M.

[0097] Alternatively it has also been found that that highly directedbeams of gas with a very small angular divergence from the nozzle axiswill exit from the nozzles 506 if gas flow is controlled by the gas flowcontrol device 560 g such that a resulting gas pressure in the manifold500M causes viscous flow of the gas from the manifold through thenozzles and into the chamber 140C when the said organic material isvaporized directly in said manifold 500M and is combined with an inertgas in manifold 500M.

[0098] In an effort to provide improved understanding of forming adirected beam of a gas flowing though a nozzle under conditions ofviscous flow, pertinent sections of “Handbook of Thin Film Technology”,edited by Leon I. Maissel and Reinhard Glang, published by McGraw HillBook Company in 1970 and “Foundations of Vacuum Science and Technologyedited by James M. Lafferty, published by John Wiley & Sons, Inc. arereferenced.

[0099] If a gas is flowing through a narrow tube it encountersresistance at the walls of the tube. Thus, gas layers at and adjacent tothe walls are slowed down, causing viscous flow. A viscosity coefficientη results from internal friction caused by intermolecular collisions.This viscosity coefficient η is given by $\begin{matrix}{\eta = {\frac{2f}{\pi \quad \sigma^{2}}\left( \frac{{mk}_{B}T}{\pi} \right)^{\frac{1}{2}}}} & (1)\end{matrix}$

[0100] where f is a factor between 0.3 and 0.5 depending on the assumedmodel of molecular interaction. For most gases, f=0.499 is a goodassumption. σ is the molecular diameter; m is the mass of a gasmolecule; κ_(B) is the Boltzmann constant; and T is the temperature ofthe gas, given in Kelvin (K).

[0101] Specifically, for a straight cylindrical tube of length I and aradius r having an inert gas flowing through it a viscous flowmicroscopic flow rate Q_(visc) can be given by $\begin{matrix}{Q_{visc} = {\frac{\pi \quad r^{4}}{8\quad \eta \quad 1}{\overset{\_}{p}\left( {p_{2} - p_{1}} \right)}}} & (2)\end{matrix}$

[0102] wherein p is the average pressure in the tube, and p₂ and p₁ arethe pressures at opposing ends of the tube.

[0103] The mean free path of a gas λ is given by $\begin{matrix}{\lambda = {\frac{k_{B}T}{\sqrt{{2\quad \pi}\quad}\sigma^{2}P} = \frac{1}{\sqrt{2}\pi \quad n\quad \sigma^{2}}}} & (3)\end{matrix}$

[0104] where σ is the molecular diameter, n is the number of moleculesper unit volume and P is the gas pressure.

[0105] When gas flows through a tube of diameter d there are in generalthree flow regimes being free molecular flow, continuum or viscous flowand transitional flow that can be used to characterize the flow.Knudsen's number Kn given by

Kn=λ/d  (4)

[0106] is used to characterize the flow regime. When Kn>0.5 the flow isin the free molecular flow regime. Here gas dynamics are dominated bymolecular collisions with the wall of the tube or vessel. Gas moleculesflow through the tube by successive collisions with the walls untilexperiencing a final collision, which ejects them through the opening.Depending on the length to diameter ratio of the tube the angulardistribution of emitted molecules can range from a cosine thetadistribution (for zero length) to a heavily beamed profile (for largelength to diameter ratio) (see Lafferty for details). Even in the caseof the heavily beamed profile, there is a significant component of theemitted flux at non zero angles to the axis of the tube. When0.01<Kn<0.5 the flow is in the transitional flow regime in which bothmolecular collisions with the wall and intermolecular collisionsinfluence flow characteristics of the gas. As Kn gets lower we approachthe viscous flow regime and the flow is dominated by intermolecularcollisions. When Kn<0.01 the flow is in the viscous flow regime. Herethe mean free path of the gas is small compared to the diameter of thetube and intermolecular collisions are much more frequent than wallcollisions. When operating in the viscous flow regime gas coming out ofthe tube orifice usually flows smoothly in streamlines generallyparallel to the walls of the orifice and can be highly directed in thecase of large length to diameter ratios.

[0107] For certain vaporizable materials, the vapor pressure at usefultemperatures is low enough that it is difficult to attain viscous flowfor small openings, such as would be useful in producing pixilated OLEDdisplays. In such cases, an additional gas (for example an inert gasacting solely as a carrier) may be used to produce the viscous flow.

[0108] The vapor pressure p* of a gas can be approximated from therelationship

Log p* =A/T+B+C Log T  (5)

[0109] where A, B, and C are constants. The vapor pressure of Alq hasbeen measured to vary from 0.024-0.573 Torr from 250-350° C. The bestfit coefficients were found to be A=−2245.996, B=−21.714 and C=8.973.The mean free path for Alq varies from 0.5-0.0254 mm at the vaporpressure over the temperature range 250-350° C. Thus the vapor pressureof Alq alone is insufficient to produce viscous flow in a circularnozzle structure with a 100 μm tube diameter over the temperature range250-350° C. A vapor pressure of approximately 15 Torr will be requiredto get into the viscous flow regime for Alq and this tube diameter.

[0110] The vapor flow control devices 560 v and the gas flow controldevice 560 g can be manually adjustable flow control valves.Alternatively, these flow control devices can be mass-flow controldevices which can be adjusted in a graduated manner from a closedposition to an open position in response to electrical control signalsprovided by controllers which, in turn, can be addressed by signals froma computer (not shown).

[0111] One of the organic material vapor sources, for example the vaporsource 500VS4, is charged with a vaporizable organic host material. Thisorganic host material can be in the form of a powder, flakes,particulates or liquid. If a full-color (RGB) OLED display is to beformed, each of the remaining organic material vapor sources, forexample the vapor sources 500VS1, 500VS2, and 500VS3, is charged with adifferent vaporizable organic dopant material. For example, the vaporsource 500VS1 is charged with a dopant material, which provides greenlight emission from a pixelated doped layer 14G of the organic hostmaterial. The vapor source 500VS2 can be charged with a dopant material,which provides red light emission from a pixelated doped layer 14R ofthe organic host material. The vapor source 500VS3 receives a dopantmaterial, which provides blue light emission from a pixelated dopedlayer 14B of the organic host material. The organic dopant materials canbe in the form of a powder, flakes, particulates or liquid.

[0112] Using the above described examples of the vapor sources and therespective charges of organic materials, the vapor deposition apparatus500 can be operated as follows to provide full-color pixelation on asubstrate 11 or on a substrate 51, depicted here as a stripe pattern ofa light-emitting layer 14R (or 14G, or 14B). The vapor source 500VS2(red dopant) and the vapor source VS4 (host material) are heated tovaporization temperatures which causes the respective organic materialsto vaporize, usually by sublimation. The corresponding vapor flowcontrol devices 560 v are actuated so that a controlled dopant vaporflow and a controlled host vapor flow passes from these two vaporsources via lower and upper vapor transport conduits (546 a and 546 b,respectively), the combiner 570, and the common conduit 546 c, into themanifold 500M in which complete “molecular mixing” of the host materialvapor and the dopant material vapor are achieved. These vapors of theorganic materials create a vapor pressure PV within the manifold whichcan be approximately 0.024-0.573 Torr over the sublimation range from250-350° C. for Alq, as described in more detail in conjunction withFIG. 14.

[0113] Flow of an inert gas, for example nitrogen or argon gas, isinitiated by controlling an opening in the gas flow control device 560 gupon opening the gas shut-off valve 562 which is included in the inertgas supply 500IGS. The flowing inert gas is preheated in the inert gaspreheater 564, and preheated gas passes into the manifold 500M via lowerand upper gas transport conduits (566 a and 566 b, respectively), thecombiner 570, and through the common conduit 546 c for vapor transportand gas transport. The inert gas provides a gas pressure PG in themanifold which is adjusted (via gas flow control device 500 g) to besufficient to cause viscous flow of the gas through the nozzles 506 inthe structure or nozzle plate 504, and to provide substantially directedbeams of inert gas which transport with them the mixed vapors of theorganic materials introduced into the manifold to achieve the directedbeams 510 of organic material vapors and inert gas.

[0114] The OLED display substrate 11 (51) had been previously orientedwith respect to the nozzles 506 by aligning it in a y-direction via thealignment marks 533 on the nozzle plate and corresponding alignmentwindows 233 disposed on a holder or mask frame 230 for holding thesubstrate (not shown in FIG. 8, see FIGS. 16, 17). The substrate ismoved in an x-direction over and past the directed beams 510 to receivein designated subpixels in a stripe pattern an organic redlight-emitting layer 14R. The stripe pattern is provided by moving ortranslating the substrate in a forward motion “F” from a startingposition “I” to an end position “II” of forward motion. Alternatively,it is possible to fix the substrate position and translate the manifoldin reference to that substrate.

[0115] Vapor flow from the vapor sources 500VS4 (host material) and500VS2 (red dopant) is now discontinued by closing the correspondingvapor flow control devices 560 v, and by discontinuing heating of thevapor source 500VS2. The flow of preheated gas into the manifold andthrough the nozzles can continue, or it can be discontinued by closingthe gas flow control device 560 g. Additionally, a shutter device (seeFIG. 16) can be positioned over the nozzle plate to block residual vaporstreams or residual directed beams from reaching the substrate during areverse or return motion “R” from the position “II” to the position “I”.

[0116] The substrate 11 (51) is now moved or translated from theposition “II” by a reverse or return motion “R” back to the startingposition “I”. The vapor source 500VS1 (green dopant) is heated to causesublimation of this dopant and introduction of “green” dopant vaporsinto the manifold at a vapor flow controlled by the vapor flow controldevice 560 v associated with the vapor source 500VS 1. The steps ofproviding vapor of the host material from source 500VS4 into themanifold, and to create directed beams 510 by flowing the preheatedinert gas into the manifold 500M to cause viscous flow in the nozzles506, are repeated. In position “I”, the substrate is reoriented orindexed with respect to the nozzles so that subpixels designated toreceive an organic green light-emitting layer 14G are aligned with thenozzles. The substrate is then moved or translated in a forwarddirection “F” over and past the directed beams issuing from the nozzles506 to the position “II” to receive in a stripe pattern in thedesignated subpixels an organic green light-emitting layer 14G.

[0117] The above described process steps are repeated by forming astripe pattern of an organic blue light-emitting layer 14B in designatedsubpixel locations of the substrate 11 (51) via the vapor sources 500VS3(blue dopant) and 500VS4 (host material). Thus, if desired, a full-colorRGB color pixelated OLED display 10-3C or 50-3C can be achieved by themethod of the invention in a vapor deposition apparatus 500.

[0118] It will be appreciated that a multicolor OLED display can be madeequally effectively by the inventive method. A structure or nozzle plate504 having nozzles 506 arranged to correspond to selected columns (orrows) of subpixels is used for that purpose.

[0119]FIG. 8 and its description include four vapor sources 500VS1 to500VS4. It will be understood that more or fewer vapor sources can beused in practicing color pixelation by the inventive method. Also, theselection of vaporizable organic materials charged into vapor sourcescan be different from the materials described with reference to FIG. 8.For example, a first vapor source can be charged with a firstvaporizable organic host material, and a second vapor source can receivea second vaporizable organic host material. A third vapor source, or athird and additional vapor sources, can be charged with vaporizableorganic dopant materials which are selected to cause emission of one ofred, green, or blue light from a pattern of a doped organiclight-emitting layer of an operative OLED display.

[0120] Using two organic host materials and one or more organic dopantmaterials in forming the doped organic light-emitting layer can provideimproved operational stability, or improved light emission, or improvedcolor of emitted light, or combinations of such improved features, of anoperative OLED display.

[0121] One or more vaporizable organic dopant materials can be chargedinto one vapor source.

[0122] Upon completion of color pixelation, all vapor sources aredeactuated by discontinuing the heating of the sources, and the inertgas flow is discontinued by closing the gas shut-off valve 562 or bycontrolling the closing of the gas flow control device 560 g. Thecompleted substrate is moved or translated in an x-direction from theposition “II” back to the position “I”. The substrate 11 (51) can beremoved from the chamber 140C in this latter position via the stationvalve 141 shown in FIG. 2 once the inert gas flow into the chamber hasbeen discontinued and the chamber 140C has been evacuated (by stationvacuum pump 142 via throttle valve 145) to a pressure which isapproximately equal to the pressure prevailing in the buffer hub 102 ofFIG. 2. The color pixelated substrate can then be advanced into thestation 150 (ETL) for vapor deposition of an organicelectron-transporting layer, which can include an electron-injectingsublayer.

[0123] Turning to FIG. 9, a structure or nozzle plate 504 is shownhaving a plurality of nozzles 506 arranged along a center line CL. Thenozzle pitch, which is the equal spacing s between nozzles, is selectedto produce the necessary deposition pattern that accurately coats thedesired subpixels of an OLED display. The total number of nozzles 506corresponds to a total number of subpixels of an OLED display which aredesignated to emit light of a selected color such as, for example redlight, green light, or blue light. Alignment marks 533 are shown here inthe form of alignment crosses, but other alignment methods can beutilized.

[0124]FIG. 10 is a sectional view of the nozzle plate 504, taken alongthe section lines 10-10 of FIG. 9. A nozzle inside dimension or a nozzlediameter d and a nozzle length dimension 1 are indicated. Nozzles 506can be of a circular outline or of a polygonal outline. Nozzle insidedimensions d can be in a range from 10 to 1000 micrometer, and directedbeams 510 (see FIG. 8) of organic material vapors and inert gas can beachieved providing that the nozzle length dimension l is at least 5times larger than the nozzle inside dimension d.

[0125] Turning to FIG. 11, a structure or nozzle plate 504T is shownwhich includes a two-dimensional array of nozzles 506 as well asalignment marks 533. The nozzle array 504T is depicted with m columns ofnozzles and having n rows of nozzles. Such nozzle plate 504T can besealingly positioned on one side of an appropriately sized manifold, anda shutter device can be positioned between the nozzle array 504T and anOLED display substrate which is to receive color pixelation so that theshutter device blocks direct line-of-sight between the nozzles 506 andthe substrate. The substrate is oriented with respect to the nozzles viathe alignment marks 533 and corresponding alignment windows 233 (seeFIGS. 16, 17) formed on a holder or mask frame 230 which accepts andtransports the substrate. The substrate is moved to be positioned overthe nozzle plate 504T and in alignment therewith. The shutter device isthen withdrawn, and directed beams of inert gas and vapors of an organichost material and of a color-forming dopant material are forming a dopedorganic light-emitting layer (such as a layer 14R, or 14G, or 14B) ondiscrete and selected subpixels of the substrate, as distinguished overthe continuous motion or translation of a substrate over and pastdirected beams to produce a stripe pattern of color pixelation.

[0126] Turning to FIG. 12, a schematic top view of a cylindrical tubularmanifold 500CM is shown. The manifold 500CM has a cylindrical manifoldhousing 536, which includes end caps 538 and 539. Manifold heatingelements 520 extend throughout the manifold and are supported by the endcaps. A plurality of nozzles 506 is formed directly in the housing 536as a line pattern along a center line CL. Alignment marks 535 areprovided along the cylindrical surface and positioned along the centerline CL.

[0127]FIG. 13 is a sectional view of the cylindrical manifold, takenalong the section lines 13-13 of FIG. 12, and defining a nozzle lengthdimension 1 and a nozzle inside dimension d. The nozzle inside dimensiond can be in a range from 10 to 1000 micrometer, and the nozzle lengthshould be at least 5 times larger than the nozzle diameter. Otherconfigurations of tubular manifolds can be used such as, for example,tubular manifolds having an ellipsoidal cross-section or a polygonalcross-section.

[0128]FIG. 13A shows a sectional view of a modified cylindrical tubularmanifold 500CM-1 in which a curved structure or curved nozzle plate 504Cis sealingly disposed over a slit-shaped aperture 537 formed in thecylindrical manifold housing 536. Nozzles 506 are formed in the curvednozzle plate 504C along a line such as shown for the line of nozzles inFIG. 12. Alignment marks 535 are provided on the curved nozzle plate(not shown in FIG. 13A).

[0129] Turning to FIG. 14, a relationship is indicated schematicallybetween divergence of an organic material vapor stream issuing from anozzle 506 and, respectively, a vapor pressure PV within the manifoldhousing 502 and the vapor pressure PV plus inert gas pressure levelsP_(G1) and P_(G2) in the manifold 500M. The divergence is indicated bydashed arrows and angles α₁, α₂, and α₃ subtending the streams issuingfrom the nozzle 506 formed in the nozzle plate 504. The reduced pressureP_(c) in the chamber 140C, which can include a pressure of an inert gasadmitted into the chamber (see FIG. 2), can be in a range from 10⁻⁷ to10⁰ Torr.

[0130] When, in the absence of inert gas flow into the manifold 500M,vapors of organic host materials and of a dopant are introduced into themanifold from respective vapor sources, a vapor pressure P_(v) ofapproximately 0.1 Torr (13 Pa) is formed in the manifold at asublimation temperature of about 300° C. in the organic material vaporsources. Such organic material vapors at this vapor pressure provide anon-viscous flow through the nozzle 506 and enter the chamber withrelatively high divergence as shown by the subtended angle α₁. Wheninert gas flow is additionally introduced into the manifold so as tocause a gas pressure P_(G1), the divergence of the vapor stream plus theinert gas stream issuing from the nozzle is reduced as depicted by thesubtended angle α₂, indicating that the introduction of the inert gashas caused some level of viscous flow behavior. When inert gas flow intothe manifold 500M is further increased to cause a gas pressureP_(G2)>P_(G1) in the manifold, the divergence of the vapor stream and ofthe inert gas stream issuing from the nozzle 506 is further reduced toprovide a substantially directed beam having a subtended angle α₃,indicating a substantial contribution to viscous flow through the nozzle506 by the inert gas at the latter gas pressure level in the manifold500M.

[0131] Turning to FIG. 15, a sectional view of an embodiment of a vaporsource 500VS is shown which is representative of the vapor sources500VS1-500VS4 depicted schematically in FIG. 8. The vapor source 500VSincludes a housing 540 having a flange 541. A gasket 542 provides asealing engagement between the flange 541 and a source cover 544 viabolts 543 which are provided around the periphery of the flange and ofthe source cover. The gasket 542 can be an annular compression gasketmade of a metal such as aluminum or copper, as is well known to thoseskilled in the art of vacuum technology.

[0132] A vaporization heater 550 extends within the housing 540,supported by feedthroughs 552 and 554, which are provided in the sourcecover 544. The vaporization heater 550 can be heated to a vaporizationtemperature which causes a vaporizable organic material 14 a (shown indashed outline) received in the vapor source 500VS to sublime and toprovide vapors (not shown) into the lower vapor transport conduit 546 a(see also FIG. 8). This conduit is sealed against the source cover 544by a seal 545.

[0133] A vaporization heater power supply 750 is connected via a lead752 to the feedthrough 552 and via a lead 754 to the feedthrough 554.Controlled heating of the vaporization heater 550 is achieved bycontrolling or regulating electrical current flow through the heater 550with a regulator 750R. Current flow is indicated by a current meter 753.

[0134] The housing 540 of the vapor source 500VS can be detached fromthe source cover 544 by removing the bolts 543. Detaching the housingpermits cleaning of residue of organic material 14 a, and allows forcharging a fresh supply of organic material 14 a.

[0135] This embodiment of a detachable vapor source and otherembodiments of detachable vapor sources useful in the practice of thepresent invention have been disclosed in a commonly assigned U.S. patentapplication Ser. No. 10/131,926, filed on Apr. 25, 2002, and entitled“Thermal Physical Vapor Deposition Apparatus With Detachable VaporSource(s)”, by Steven A. Van Slyke, the disclosure of which is hereinincorporated by reference.

[0136] Turning to FIG. 16, a schematic sectional view of the vapordeposition station 140 (LEL) of FIG. 2 is shown, taken along the sectionlines 16-16 of FIG. 2. The vapor sources 500VS and the inert gaspreheater 564 have been omitted in this drawing. The common conduit 546c extends into the manifold 500M through a thermally insulative manifoldsupport 530 which is sealed with respect to the housing 140H by a gasket532. A shutter 238 can be moved into a position of covering the nozzles506, shown in dashed outline, or into a position in which directed beams510 (not shown) can provide color pixelation of an OLED displaysubstrate 11 (51).

[0137] An OLED display substrate 11 (51) is positioned in a holder ormask frame 230 and has a spacing D from an upper surface of the nozzleplate 504 and thus from the nozzles 506. A glide shoe 225 is fixedlyattached to an upper surface of the holder 230, and is depicted here asa dovetail glide shoe. The glide shoe 225 glides matingly in a gliderail 225R, which is formed in a lead screw follower 214.

[0138] The glide shoe and the glide rail permit motion of the holder 230and of a substrate 11 (51) retained therein in a y-direction (see FIG.17) to provide alignment of the substrate with respect to the nozzles,and to index a substrate prior to each one of the color pixelating stepsdescribed with reference to FIG. 8.

[0139] A lead screw 212 engages the lead screw follower 214 and moves it(and the holder 230) in an x-direction of a forward motion “F” from astarting position “I” to an end position “II” (shown in dashed anddotted outline). During this continuous motion, the substrate 11 (51)passes over and past directed beams (not shown) of organic materialvapors and of the inert gas to provide in a stripe pattern a pixelatedorganic layer.

[0140] The lead screw 212 is formed on portions of a lead screw shaft211 which is supported in at least two locations, namely in a shaft seal211 a formed in the housing 140H of the station 140, and in a lead screwshaft termination bracket 213 which is mounted onto the housing 140H.

[0141] A lead screw drive motor 210 provides for forward motion “F” orfor reverse or return motion “R” via switch 216 which provides a controlsignal to the motor from an input terminal 218 via a lead 217. Theswitch 216 can have an intermediate or “neutral” position (not shown inFIG. 16; see FIG. 17) in which the holder or mask frame 230 (and thesubstrate) can remain either in the end position “II” of forward motion,or in the starting position “I” in which a substrate 11 (51), havingreceived color pixelation during a previous pass over the nozzles, isremoved from the holder 230 and a new substrate is received in theholder or mask frame.

[0142] An alignment detector 234 serves to align the substrate 11 (51)with respect to the nozzles 506 in the nozzle plate 504 via alignmentmarks 533 (or via alignment marks 535 if a cylindrical manifold 500CM isused) which are aligned with alignment windows 233 formed in alignmenttabs 232 that can be attached to the holder or mask frame 230. Thealignment detector detects alignment via an optical window 235 providedin the housing 140H, and along an optical alignment axis 236. It issufficient to provide optical alignment at either one of the alignmentmarks 533.

[0143] Turning to FIG. 17, a schematic top view of a portion of the LELvapor deposition station 140 of FIG. 2 is shown. The manifold 500M ispositioned on the thermally insulative manifold support 530. Alignmenttabs 232 are shown attached to the holder or mask frame 230, andalignment windows 233 are formed in these tabs in the form of a cross tocorrespond with the cross-shaped alignment marks 533 provided on thenozzle plate 504 or to the cross-shaped alignment marks 535 on thecylindrical manifold 500CM of FIG. 12.

[0144] A stepper motor 220 has a drive shaft 222 which extends throughthe stepper motor and enters the chamber 140C through a shaft seal 223formed in the housing 140H. A shaft coupling 224 can be disengaged priorto motion or translation of the holder 230 in the x-direction via thelead screw 212 which engages the lead screw follower 214. The shaftcoupling 224 is disengaged by lifting the coupling lifter 226 which isattached to the portion of the drive shaft extending through the steppermotor 220. The stepper motor 220 provides precise indexing of thesubstrate 11 (51) in a y-direction under control of a computer 221 byproviding incremental rotation of the drive shaft 222 to advance or toretreat the holder 230 via the gliding mechanism provided by the gliderail 225R (see FIG. 16) and the glide shoe 225 when the shaft coupling224 is in the engaged position, as indicated in FIG. 17.

[0145] Turning to FIG. 18, a manifold assembly 500MA is shownschematically positioned in the chamber 140C. This manifold assembly isparticularly useful in concurrently depositing in a three-color patternorganic layers onto an OLED display substrate. The manifold assembly500MA includes three mechanically connected manifolds 500MB (forproviding vapors of an organic host material and of a bluelight-emitting dopant), 500MG (for providing vapors of the organic hostmaterial and of a green light-emitting dopant), and 500MR (for providingvapors of the organic host material and of a red light-emitting dopant).Corresponding nozzles 506B, 506G, and 506R, respectively, are offsetamong the three manifolds of the assembly 500MA in correspondence to thespacing needed to accurately coat the desired individual subpixels on anOLED display substrate 11 (51). Only one of the manifolds is providedwith one or two alignment marks 533. It is noted that other alignmentmethods can also be utilized.

[0146] Each of the manifolds 500MB, 500MG, and 500MR receives a vapor ofan organic host material from, for example, the vapor source 500VS4 viaa vapor flow control device and via a common conduit 547 c for vaportransport from the host material vapor source and for transport of inertgas. The combiner 570 combines the organic host material vapor and thepreheated inert gas and delivers such combination into the commonconduit 547 c.

[0147] The manifold 500 MB also receives a “blue” dopant vapor providedin this drawing by the vapor source 500VS3. The manifold 500MG alsoreceives a “green” dopant layer which is provided here by the vaporsource 500VS1, and the manifold 500MR also receives a “red” dopant vaporprovided by the vapor source 500VS2.

[0148] As described above, the substrate 11 (51) is first oriented oraligned with respect to, for example, the alignment marks 533 associatedwith manifold 500MG. The substrate is then moved or translated along thex-direction to the starting position “I”. Directed beams are nextprovided through the nozzles 506B, 506G, and 506R. The substrate is thenmoved or translated over and past the directed beams to the end position“II” to receive concurrently a pattern of color pixelation in the formof repeating red, green, and blue stripes of light-emitting layers 14R,14G, and 14B, respectively, and in correspondence with designatedsubpixel columns to be formed on the OLED display substrate 11 (51). Itis understood that while a simple row/column pixelation structure isshown, the described invention can be coupled with shuttering, othermanifold geometries or other relative motion patterns to produce morecomplicated multicolor pixel deposition patterns.

[0149] Preferred materials for constructing the structure or nozzleplate(s) 504, 504C, and 504T include metals, glass, quartz, graphite andceramics. The manifold housing 502, 536 can also be constructed from oneof the above preferred materials. The material for constructing themanifold housing need not be the same materials for constructing anozzle plate. For example, a manifold housing can be made of a metal,and nozzle plate can be made of glass.

[0150] It is understood that while PVD only has been discussed in thisdisclosure, the invention may also be used such that precursor speciesare fed into the manifold, reacted to form new molecular products, andthese new products issued in the described manner from the nozzle arrayand deposited on suitable substrates.

[0151] Other Features of an OLED Display

[0152] Substrate

[0153] The OLED display is typically provided over a supportingsubstrate where either cathodes or anodes of the OLED display can be incontact with the substrate. The electrodes in contact with the substrateare conveniently referred to as bottom electrodes. Conventionally,bottom electrodes are the anodes, but this invention is not limited tothat configuration. The substrate can either be light-transmissive oropaque, depending on the intended direction of light emission. Thelight-transmissive property is desirable for viewing the light emissionthrough the substrate. Transparent glass or plastic is commonly employedin such cases. For applications where the light emission is viewedthrough the top electrode(s), the transmissive characteristic of thebottom support is immaterial, and therefore can be light-transmissive,light-absorbing or light-reflective. Substrates for use in this caseinclude, but are not limited to, glass, plastic, semiconductormaterials, silicon, ceramics, and circuit board materials. Of course itis necessary to provide in these device configurations alight-transmissive top electrode or top electrodes.

[0154] Anodes

[0155] When light emission is viewed through anodes 12 or anode pads 52,such electrodes should be transparent or substantially transparent tothe emission of interest. Common transparent anode materials used inthis invention are indium-tin oxide (ITO) and tin oxide, but other metaloxides can work including, but not limited to, aluminum- or indium-dopedzinc oxide (IZO), magnesium-indium oxide, and nickel-tungsten oxide. Inaddition to these oxides, metal nitrides, such as gallium nitride, andmetal selenides, such as zinc selenide, and metal sulfides, such as zincsulfide, can be used as anodes 12 (52). For applications where lightemission is viewed only through the cathode electrode or electrodes, thetransmissive characteristics of anodes are immaterial and any conductivematerial can be used, transparent, opaque or reflective. Exampleconductors for this application include, but are not limited to, gold,iridium, molybdenum, palladium, and platinum. Typical anode materials,transmissive or otherwise, have a work function of 4.1 eV or greater.Desired anode materials are commonly deposited by any suitable meanssuch as evaporation, sputtering, chemical vapor deposition, orelectrochemical means. Anodes can be patterned using well-knownphotolithographic processes.

[0156] Hole-Injecting Layer (HIL)

[0157] While not always necessary, it is often useful that ahole-injecting layer be provided between anodes and a hole-transportinglayer 13 (53). The hole-injecting material can serve to improve the filmformation property of subsequent organic layers and to facilitateinjection of holes into the hole-transporting layer. Suitable materialsfor use in the hole-injecting layer include, but are not limited to,porphyrinic compounds as described in U.S. Pat. No. 4,720,432, andplasma-deposited fluorocarbon polymers as described in U.S. Pat. No.6,208,075. Alternative hole-injecting materials reportedly useful inorganic EL devices are described in EP 0 891 121 A1 and EP 1 029 909 A1.

[0158] Hole-Transporting Layer (HTL)

[0159] The hole-transporting layer 13 (53) of the organic EL displaycontains at least one hole-transporting compound such as an aromatictertiary amine, where the latter is understood to be a compoundcontaining at least one trivalent nitrogen atom that is bonded only tocarbon atoms, at least one of which is a member of an aromatic ring. Inone form the aromatic tertiary amine can be an arylamine, such as amonoarylamine, diarylamine, triarylamine, or a polymeric arylamine.Exemplary monomeric triarylamines are illustrated by Klupfel et al. U.S.Pat. No. 3,180,730. Other suitable triarylamines substituted with one ormore vinyl radicals and/or comprising at least one active hydrogencontaining group are disclosed by Brantley et al U.S. Pat. Nos.3,567,450 and 3,658,520.

[0160] A more preferred class of aromatic tertiary amines are thosewhich include at least two aromatic tertiary amine moieties as describedin U.S. Pat. Nos. 4,720,432 and 5,061,569. Such compounds include thoserepresented by structural formula (A)

[0161] wherein Q₁ and Q₂ are independently selected aromatic tertiaryamine moieties and G is a linking group such as an arylene,cycloalkylene, or alkylene group of a carbon to carbon bond. In oneembodiment, at least one of Q₁ or Q₂ contains a polycyclic fused ringstructure, e.g., a naphthalene. When G is an aryl group, it isconveniently a phenylene, biphenylene, or naphthalene moiety.

[0162] A useful class of triarylamines satisfying structural formula (A)and containing two triarylamine moieties is represented by structuralformula (B)

[0163] where:

[0164] R₁ and R₂ each independently represents a hydrogen atom, an arylgroup, or an alkyl group or R₁ and R₂ together represent the atomscompleting a cycloalkyl group; and

[0165] R₃ and R₄ each independently represents an aryl group, which isin turn substituted with a diaryl substituted amino group, as indicatedby structural formula (C)

[0166] wherein R₅ and R₆ are independently selected aryl groups. In oneembodiment, at least one of R₅ or R₆ contains a polycyclic fused ringstructure, e.g., a naphthalene.

[0167] Another class of aromatic tertiary amines are thetetraaryldiamines. Desirable tetraaryldiamines include two diarylaminogroups, such as indicated by formula (C), linked through an arylenegroup. Useful tetraaryldiamines include those represented by formula (D)

[0168] wherein:

[0169] each Are may be an independently selected arylene group, such asa phenylene or anthracene moiety;

[0170] n is an integer of from 1 to 4; and

[0171] Ar, R₇, R₈, and R₉ are independently selected aryl groups. In atypical embodiment, at least one of Ar, R₇, R₈, and R₉ is a polycyclicfused ring structure, e.g., a naphthalene.

[0172] The various alkyl, alkylene, aryl, and arylene moieties of theforegoing structural formulae (A), (B), (C), (D), can each in turn besubstituted. Typical substituents include alkyl groups, alkenyl, alkoxygroups, aryl groups, aryloxy groups, and halogen such as fluoride,chloride, and bromide. The various alkyl and alkylene moieties typicallycontain from about 1 to 6 carbon atoms. The cycloalkyl moieties cancontain from 3 to about 10 carbon atoms, but typically contain five,six, or seven ring carbon atoms—e.g., cyclopentyl, cyclohexyl, andcycloheptyl ring structures. The aryl and arylene moieties are usuallyphenyl and phenylene moieties.

[0173] The hole-transporting layer can be formed of a single or amixture of aromatic tertiary amine compounds. Specifically, one canemploy a triarylamine, such as a triarylamine satisfying the formula(B), in combination with a tetraaryldiamine, such as indicated byformula (D). When a triarylamine is employed in combination with atetraaryldiamine, the latter is positioned as a layer interposed betweenthe triarylamine and the electron injecting and transporting layer.Illustrative of useful aromatic tertiary amines are the following:

[0174] 1,1-Bis(4-di-p-tolylaminophenyl)cyclohexane

[0175] 1,1-Bis(4-di-p-tolylaminophenyl)-4-phenylcyclohexane

[0176] 4,4′-Bis(diphenylamino)quadriphenyl

[0177] Bis(4-dimethylamino-2-methylphenyl)-phenylmethane

[0178] N,N,N-Tri(p-tolyl)amine

[0179] 4-(di-p-tolylamino)-4′-[4(di-p-tolylamino)-styryl]stilbene

[0180] N,N,N′,N′-Tetra-p-tolyl-4-4′-diaminobiphenyl

[0181] N,N,N′,N′-Tetraphenyl-4,4′-diaminobiphenyl

[0182] N,N,N′,N′-tetra-1-naphthyl-4,4′-diaminobiphenyl

[0183] N,N,N′,N′-tetra-2-naphthyl-4,4′-diaminobiphenyl

[0184] N-Phenylcarbazole

[0185] 4,4′-Bis[N-(1-naphthyl)-N-phenylamino]biphenyl

[0186] 4,4′-Bis[N-(1-naphthyl)-N-(2-naphthyl)amino]biphenyl

[0187] 4,4″-Bis[N-(1-naphthyl)-N-phenylamino]p-terphenyl

[0188] 4,4′-Bis[N-(2-naphthyl)-N-phenylamino]biphenyl

[0189] 4,4′-Bis[N-(3-acenaphthenyl)-N-phenylamino]biphenyl

[0190] 1,5-Bis[N-(1-naphthyl)-N-phenylamino]naphthalene

[0191] 4,4′-Bis[N-(9-anthryl)-N-phenylamino]biphenyl

[0192] 4,4″-Bis[N-(1-anthryl)-N-phenylamino]-p-terphenyl

[0193] 4,4′-Bis[N-(2-phenanthryl)-N-phenylamino]biphenyl

[0194] 4,4′-Bis[N-(8-fluoranthenyl)-N-phenylamino]biphenyl

[0195] 4,4′-Bis[N-(2-pyrenyl)-N-phenylamino]biphenyl

[0196] 4,4′-Bis[N-(2-naphthacenyl)-N-phenylamino]biphenyl

[0197] 4,4′-Bis[N-(2-perylenyl)-N-phenylamino]biphenyl

[0198] 4,4′-Bis[N-(1-coronenyl)-N-phenylamino]biphenyl

[0199] 2,6-Bis(di-p-tolylamino)naphthalene

[0200] 2,6-Bis[di-(1-naphthyl)amino]naphthalene

[0201] 2,6-Bis[N-(1-naphthyl)-N-(2-naphthyl)amino]naphthalene

[0202] N,N,N′,N′-Tetra(2-naphthyl)-4,4″-diamino-p-terphenyl

[0203] 4,4′-Bis {N-phenyl-N-[4-(1-naphthyl)-phenyl]amino}biphenyl

[0204] 4,4′-Bis[N-phenyl-N-(2-pyrenyl)amino]biphenyl

[0205] 2,6-Bis[N,N-di(2-naphthyl)amine]fluorene

[0206] 1,5-Bis[N-(1-naphthyl)-N-phenylamino]naphthalene

[0207] Another class of useful hole-transporting materials includespolycyclic aromatic compounds as described in EP 1 009 041. In addition,polymeric hole-transporting materials can be used such aspoly(N-vinylcarbazole) (PVK), polythiophenes, polypyrrole, polyaniline,and copolymers such aspoly(3,4-ethylenedioxythiophene)/poly(4-styrenesulfonate) also calledPEDOT/PSS.

[0208] Light-Emitting Layer (LEL)

[0209] As more fully described in U.S. Pat. Nos. 4,769,292 and5,935,721, the light-emitting layer (LEL) 14 (14R, 14G, 14B) and 54R,54G, 54B of the organic EL display includes a luminescent or fluorescentmaterial where electroluminescence is produced as a result ofelectron-hole pair recombination in this region. The light-emittinglayer can be comprised of a single material, but more commonly consistsof at least one host material doped with a guest compound or compounds(a dopant or dopants) where light emission comes primarily from thedopant and can be of any color. The host materials in the light-emittinglayer can be an electron-transporting material, as defined below, ahole-transporting material, as defined above, or another material orcombination of materials that support hole-electron recombination. Thedopant is usually chosen from highly fluorescent dyes, butphosphorescent compounds, e.g., transition metal complexes as describedin WO 98/55561, WO 00/18851, WO 00/57676, and WO 00/70655 are alsouseful. Dopants are typically coated at 0.01 to 10% by weight into thehost material. Polymeric materials such as polyfluorenes andpolyvinylarylenes (e.g., poly(p-phenylenevinylene), PPV) can also beused as the host material. In this case, small molecule dopants can bemolecularly dispersed into the polymeric host, or the dopant could beadded by copolymerizing a minor constituent into the host polymer.

[0210] An important relationship for choosing a dye as a dopant is acomparison of the bandgap potential which is defined as the energydifference between the highest occupied molecular orbital and the lowestunoccupied molecular orbital of the molecule. For efficient energytransfer from the host to the dopant molecule, a necessary condition isthat the band gap of the dopant is smaller than that of the hostmaterial.

[0211] Host and emitting dopant molecules known to be of use include,but are not limited to, those disclosed in U.S. Pat. Nos. 4,768,292;5,141,671; 5,150,006; 5,151,629; 5,405,709; 5,484,922; 5,593,788;5,645,948; 5,683,823; 5,755,999; 5,928,802; 5,935,720; 5,935,721; and6,020,078.

[0212] Metal complexes of 8-hydroxyquinoline and similar derivatives(Formula E) constitute one class of useful host compounds capable ofsupporting electroluminescence, and are particularly suitable for lightemission of wavelengths longer than 500 nm, e.g., green, yellow, orange,and red.

[0213] wherein:

[0214] M represents a metal;

[0215] n is an integer of from 1 to 4; and

[0216] Z independently in each occurrence represents the atomscompleting a nucleus having at least two fused aromatic rings.

[0217] From the foregoing it is apparent that the metal can bemonovalent, divalent, trivalent, or tetravalent metal. The metal can,for example, be an alkali metal, such as lithium, sodium, or potassium;an alkaline earth metal, such as magnesium or calcium; an earth metal,such aluminum or gallium, or a transition metal such as zinc orzirconium. Generally any monovalent, divalent, trivalent, or tetravalentmetal known to be a useful chelating metal can be employed.

[0218] Z completes a heterocyclic nucleus containing at least two fusedaromatic rings, at least one of which is an azole or azine ring.Additional rings, including both aliphatic and aromatic rings, can befused with the two required rings, if required. To avoid addingmolecular bulk without improving on function the number of ring atoms isusually maintained at 18 or less.

[0219] Illustrative of useful chelated oxinoid compounds are thefollowing:

[0220] CO-1: Aluminum trisoxine [alias,tris(8-quinolinolato)aluminum(III)]

[0221] CO-2: Magnesium bisoxine [alias,bis(8-quinolinolato)magnesium(II)]

[0222] CO-3: Bis[benzo {f}-8-quinolinolato]zinc (II)

[0223] CO-4:Bis(2-methyl-8-quinolinolato)aluminum(III)-μ-oxo-bis(2-methyl-8-quinolinolato)aluminum(III)

[0224] CO-5: Indium trisoxine [alias, tris(8-quinolinolato)indium]

[0225] CO-6: Aluminum tris(5-methyloxine) [alias,tris(5-methyl-8-quinolinolato) aluminum(III)]

[0226] CO-7: Lithium oxine [alias, (8-quinolinolato)lithium(I)]

[0227] CO-8: Gallium oxine [alias, tris(8-quinolinolato)gallium(III)]

[0228] CO-9: Zirconium oxine [alias,tetra(8-quinolinolato)zirconium(IV)]

[0229] Derivatives of 9,10-di-(2-naphthyl)anthracene (Formula F)constitute one class of useful hosts capable of supportingelectroluminescence, and are particularly suitable for light emission ofwavelengths longer than 400 nm, e.g., blue, green, yellow, orange orred. F

[0230] wherein R¹, R², R³, R⁴, R⁵, and R⁶ represent one or moresubstituents on each ring where each substituent may be individuallyselected from the following groups:

[0231] Group 1: hydrogen, alkenyl, alkyl, or cycloalkyl of from 1 to 24carbon atoms;

[0232] Group 2: aryl or substituted aryl of from 5 to 20 carbon atoms;

[0233] Group 3: carbon atoms from 4 to 24 necessary to complete a fusedaromatic ring such as anthracenyl; pyrenyl, or perylenyl;

[0234] Group 4: heteroaryl or substituted heteroaryl of from 5 to 24carbon atoms as necessary to complete a fused heteroaromatic ring offuryl, thienyl, pyridyl, quinolinyl or other heterocyclic systems;

[0235] Group 5: alkoxylamino, alkylamino, or arylamino of from 1 to 24carbon atoms; and

[0236] Group 6: fluorine, chlorine, bromine or cyano.

[0237] Illustrative examples include 9,10-di-(2-naphthyl)anthracene and2-t-butyl-9,10-di-(2-naphthyl)anthracene. Other anthracene derivativescan be useful as a host in the LEL, including derivatives of9,10-bis[4-(2,2-diphenylethenyl)phenyl]anthracene.

[0238] Benzazole derivatives (Formula G) constitute another class ofuseful hosts capable of supporting electroluminescence, and areparticularly suitable for light emission of wavelengths longer than 400nm, e.g., blue, green, yellow, orange or red.

[0239] where:

[0240] n is an integer of 3 to 8;

[0241] Z is O, NR or S;

[0242] R and R′ are individually hydrogen; alkyl of from 1 to 24 carbonatoms, for example, propyl, t-butyl, heptyl, and the like; aryl orhetero-atom substituted aryl of from 5 to 20 carbon atoms for examplephenyl and naphthyl, furyl, thienyl, pyridyl, quinolinyl and otherheterocyclic systems; or halo such as chloro, fluoro; or atoms necessaryto complete a fused aromatic ring; and there may be up to 4 R′ groupsper benzazole unit; and

[0243] L is a linkage unit consisting of alkyl, aryl, substituted alkyl,or substituted aryl, which conjugately or unconjugately connects themultiple benzazoles together.

[0244] An example of a useful benzazole is 2, 2′,2″-(1,3,5-phenylene)tris[1-phenyl-1H-benzimidazole].

[0245] Distyrylarylene derivatives as described in U.S. Pat. No.5,121,029 are also useful host material for the LEL.

[0246] Desirable fluorescent dopants include derivatives of anthracene,tetracene, xanthene, perylene, rubrene, coumarin, rhodamine,quinacridone, dicyanomethylenepyran compounds, thiopyran compounds,polymethine compounds, pyrilium and thiapyrilium compounds, fluorenederivatives, periflanthene derivatives, and carbostyryl compoundsillustrative examples of useful dopants include, but are not limited to,the following:

X R1 R2 L9 O H H L10 O H Methyl L11 O Methyl H L12 O Methyl Methyl L13 OH t-butyl L14 O t-butyl H L15 O t-butyl t-butyl L16 S H H L17 S H MethylL18 S Methyl H L19 S Methyl Methyl L20 S H t-butyl L21 S t-butyl H L22 St-butyl H

X R1 R2 L23 O H H L24 O H Methyl L25 O Methyl H L26 O Methyl Methyl L27O H t-butyl L28 O t-butyl H L29 O t-butyl t-butyl L30 S H H L31 S HMethyl L32 S Methyl H L33 S Methyl Methyl L34 S H t-butyl L35 S t-butylH L36 S t-butyl t-butyl

R R L37 phenyl L38 methyl L39 t-butyl L40 mesityl

R L41 phenyl L42 methyl L43 t-butyl L44 mesityl

[0247] Electron-Transporting Layer (ETL)

[0248] Preferred thin film-forming materials for use in forming theelectron-transporting layer 15 (55) of the organic EL display are metalchelated oxinoid compounds, including chelates of oxine itself (alsocommonly referred to as 8-quinolinol or 8-hydroxyquinoline). Suchcompounds help to inject and transport electrons and exhibit both highlevels of performance and are readily fabricated in the form of thinfilms. Exemplary of contemplated oxinoid compounds are those satisfyingstructural formula (E), previously described.

[0249] Other electron-transporting materials include various butadienederivatives as disclosed in U.S. Pat. No. 4,356,429 and variousheterocyclic optical brighteners as described in U.S. Pat. No.4,539,507. Benzazoles satisfying structural formula (G) are also usefulelectron-transporting materials.

[0250] Cathode(s)

[0251] When light emission is viewed solely through the anode(s), thecommon cathode 56 or the cathodes 16 can be comprised of nearly anyconductive material. Desirable materials have good film-formingproperties to ensure good contact with the underlying organic layer,promote electron injection at low voltage, and have good stability.Useful cathode materials often contain a low work function metal (<4.0eV) or metal alloy. One preferred cathode material is comprised of aMg:Ag alloy wherein the percentage of silver is in the range of 1 to20%, as described in U.S. Pat. No. 4,885,221. Another suitable class ofcathode materials includes bilayers comprising a thin electron-injectionlayer (EIL) in contact with the organic layer (e.g., ETL) which iscapped with a thicker layer of a conductive metal. Here, the EILpreferably includes a low work function metal or metal salt, and if so,the thicker capping layer does not need to have a low work function. Onesuch cathode is comprised of a thin layer of LiF followed by a thickerlayer of Al as described in U.S. Pat. No. 5,677,572. Other usefulcathode material sets include, but are not limited to, those disclosedin U.S. Pat. Nos. 5,059,861; 5,059,862, and 6,140,763.

[0252] When light emission is viewed through the cathode, the cathodemust be transparent or nearly transparent. For such applications, metalsmust be thin or one must use transparent conductive oxides, or acombination of these materials. Optically transparent cathodes have beendescribed in more detail in U.S. Pat. No. 5,776,623. Cathode materialscan be deposited by evaporation, sputtering, or chemical vapordeposition. When needed, patterning can be achieved through many wellknown methods including, but not limited to, through-mask deposition,integral shadow masking as described in U.S. Pat. No. 5,276,380 and EP 0732 868, laser ablation, and selective chemical vapor deposition.

[0253] Encapsulation

[0254] Most OLED devices and displays are sensitive to moisture oroxygen, or both, so they are commonly sealed in an inert atmosphere suchas nitrogen or argon, along with a desiccant such as alumina, bauxite,calcium sulfate, clays, silica gel, zeolites, alkaline metal oxides,alkaline earth metal oxides, sulfates, or metal halides andperchlorates. Methods for encapsulation and desiccation include, but arenot limited to, those described in U.S. Pat. No. 6,226,890. In addition,barrier layers such as SiOx, Teflon, and alternating inorganic/polymericlayers are known in the art for encapsulation.

[0255] The invention has been described in detail with particularreference to certain preferred embodiments thereof, but it will beunderstood that variations and modifications can be effected within thespirit and scope of the invention. For example, rather than usingorganic materials, inorganic materials can also be used in accordancewith the present invention.

PARTS LIST

[0256]10 single-color or monochrome passive matrix OLED device ordisplay

[0257]10-3C three-color or full-color passive matrix OLED display

[0258]11 OLED display substrate

[0259]12 light-transmissive first electrodes or anodes

[0260]13 organic hole-injecting and hole-transporting layer (HTL)

[0261]14 organic light-emitting layer (LEL)

[0262]14 a vaporizable organic material(s)

[0263]14R organic red-light-emitting layer

[0264]14G organic green-light-emitting layer

[0265]14B organic blue-light-emitting layer

[0266]15 organic electron-transporting layer (ETL)

[0267]16 second electrodes or cathodes

[0268]18 encapsulation or cover

[0269]50-3C three-color or full-color active matrix OLED display

[0270]51 OLED display substrate

[0271]52 light-transmissive first electrode pads or anode pads

[0272]53 organic hole-injecting and hole-transporting layer

[0273]54R organic red-light-emitting layer

[0274]54G organic green-light-emitting layer

[0275]54B organic blue-light-emitting layer

[0276]55 organic electron-transporting layer

[0277]56 common second electrode or cathode

[0278]61-1 transistors, capacitor, and electrical wiring (in subpixel1;1)

[0279]61-2 transistors, capacitor, and electrical wiring (in subpixel1;2)

[0280]61-3 transistors, capacitor, and electrical wiring (in subpixel1;3)

[0281]64 conductive wiring

[0282]66 light-transmissive organic insulator layer

[0283]68 organic insulator layer

[0284]87 X-direction driving circuit

[0285]88 Y-direction driving circuit

[0286]100 OLED apparatus

[0287]102 buffer hub

[0288]103 unload station

[0289]104 transfer hub

[0290]105 connector port

[0291]106 vacuum pump

[0292]107 pumping port

[0293]108 pressure gauge

[0294]110 load station

[0295]110C chamber

[0296]110H housing

[0297]111 carrier (for substrates or structures)

[0298]130 vapor deposition station (organic HTL)

[0299]140 vapor deposition station (organic LEL)

[0300]140C chamber

[0301]140H housing

[0302]141 station valve

[0303]142 station vacuum pump

[0304]144 station pumping port

[0305]145 throttle valve

[0306]146 station pressure sensor

[0307]147 inert gas supply

[0308]148 conduit

[0309]149 gas flow controller

[0310]150 vapor deposition station (organic ETL)

[0311]160 vapor deposition station (second electrodes)

[0312]170 storage station

[0313]180 encapsulation station

[0314]210 lead screw drive motor

[0315]211 lead screw shaft

[0316]211 a shaft seal

[0317]212 lead screw

[0318]213 lead screw shaft termination bracket

[0319]214 lead screw follower

[0320]216 switch

[0321]217 lead

[0322]218 input terminal

[0323]220 stepper motor for indexing in y-direction

[0324]221 computer for indexing in y-direction

[0325]222 drive shaft

[0326]223 shaft seal

[0327]224 shaft coupling

[0328]225 glide shoe

[0329]225R glide rail

[0330]226 coupling lifter

[0331]230 holder or mask frame

[0332]232 alignment tab(s)

[0333]233 alignment window(s)

[0334]234 alignment detector

[0335]235 optical window

[0336]236 optical alignment axis

[0337]238 shutter

[0338]500 vapor deposition apparatus

[0339]500M manifold

[0340]500MA manifold assembly

[0341]500MB manifold for providing blue light-emitting organic materialvapor

[0342]500MG manifold for providing green light-emitting organic materialvapor

[0343]500MR manifold for providing red light-emitting organic materialvapor

[0344]500IGS inert gas supply

[0345]500VS organic material vapor source

[0346]500VS1 organic material vapor source

[0347]500VS2 organic material vapor source

[0348]500VS3 organic material vapor source

[0349]500VS4 organic material vapor source

[0350]500CM cylindrical tubular manifold

[0351]500CM-1 modified cylindrical tubular manifold

[0352]502 manifold housing

[0353]504 structure or nozzle plate

[0354]504C curved structure or curved nozzle plate

[0355]504T structure or nozzle plate for two-dimensional nozzle array

[0356]506 nozzles

[0357]506B nozzles in manifold 500 MB

[0358]506G nozzles in manifold 500MG

[0359]506R nozzles in manifold 500MR 510 directed beam(s) of organicmaterial vapor(s) and inert gas 520 manifold heating element(s) 530thermally insulative manifold support 532 gasket 533 alignment mark(s)on nozzle plate (504) 535 alignment mark(s) on cylindrical tubularmanifold (500CM) 536 cylindrical manifold housing 537 slit-shapedaperture in cylindrical manifold housing (536) 538 end cap 539 end cap540 housing of vapor source (500VS) 541 flange 542 gasket 543 bolt(s)544 source cover 545 seal 546 a lower vapor transport conduit 546 bupper vapor transport conduit 546 c common conduit for vapor transportand gas transport 547 c common conduit for vapor transport from onevapor source and for gas transport 550 vaporization heater 552feedthrough 554 feedthrough 560 g gas flow control device 560 v vaporflow control device 562 gas shut-off valve

[0360]564 inert gas preheater

[0361]566 a lower gas transport conduit

[0362]566 b upper gas transport conduit

[0363]570 combiner

[0364]600 heatable enclosure

[0365]750 vaporization heater power supply

[0366]750R regulator

[0367]752 lead

[0368]753 current meter

[0369]754 lead

[0370] ∝ angle subtending vapor stream issuing from nozzles (506)

[0371] CL center line of line of nozzles

[0372] D spacing between substrate (11 ;5 1) and nozzles (506)

[0373] d inside dimension or diameter of nozzles (506)

[0374] l length dimension of nozzles (506)

[0375] EL organic electroluminescent or electroluminescence medium

[0376] “F” forward motion of substrate

[0377] “R” reverse or return motion of substrate

[0378] “I” starting position of substrate

[0379] “II” end position of forward motion and beginning position ofreverse motion of substrate

[0380] pix pixel

[0381] P_(c) reduced pressure in chamber (140C)

[0382] P_(G) inert gas pressure in manifold (500M)

[0383] P_(V) vapor pressure of organic material(s) in manifold (500M)

[0384] P_(v)+P_(g) combined pressure in manifold (500M) of inert gas andorganic material vapor(s)

[0385] s nozzle pitch or spacing between nozzles in a nozzle plate (504)

[0386] T_(e) temperature within heatable enclosure (600)

[0387] x motion in x-direction of substrate (11 ;51)

[0388] y indexed motion in y-direction of substrate (11 ;5 1)

[0389] m columns of nozzles (506) of two-dimensional array of nozzles(504T)

[0390] n rows of nozzles (506) of two-dimensional array of nozzles(504T)

[0391] Xn X-direction signal lines where n is an integer

[0392] Ym Y-direction signal lines where m is an integer

[0393] Vddn power supply lines

[0394] TSnm thin-film transistors for switching

[0395] TCnm thin-film transistors for power control

[0396] ELnm organic electroluminescent medium in each pixel or sub-pixel

[0397] Cnm thin-film capacitors

What is claimed is:
 1. A method of depositing in a pattern an organiclayer onto an OLED display substrate, comprising the steps of: a)providing a manifold and an OLED display substrate in a chamber atreduced pressure and spaced relative to each other; b) providing astructure sealingly covering one surface of the manifold, the structureincluding a plurality of nozzles extending through the structure intothe manifold, and the nozzles being spaced from each other incorrespondence with the pattern to be deposited onto the OLED displaysubstrate; c) orienting the OLED display substrate with respect to thenozzles in the structure; d) delivering vaporized organic materials intothe manifold; and e) applying an inert gas under pressure into themanifold so that the inert gas provides a viscous gas flow through eachof the nozzles, such viscous gas flow transporting at least portions ofthe vaporized organic materials from the manifold through the nozzles toprovide directed beams of the inert gas and of the vaporized organicmaterials and projecting the directed beams onto the OLED displaysubstrate for depositing a pattern of an organic layer on the substrate.2. A method of depositing in a pattern an organic layer onto an OLEDdisplay substrate, comprising the steps of: a) providing a manifold andan OLED display substrate in a chamber at reduced pressure and spacedrelative to each other; b) providing a structure sealingly covering onesurface of the manifold, the structure including a plurality of nozzlesextending through the structure into the manifold, and the nozzles beingspaced from each other in correspondence with the pattern to bedeposited onto the OLED display substrate; c) orienting the OLED displaysubstrate with respect to the nozzles in the structure; d) vaporizingorganic materials in the manifold; and e) applying an inert gas underpressure into the manifold so that the inert gas provides a viscous gasflow through each of the nozzles, such viscous gas flow transporting atleast portions of the vaporized organic materials from the manifoldthrough the nozzles to provide directed beams of the inert gas and ofthe vaporized organic materials and projecting the directed beams ontothe OLED display substrate for depositing a pattern of an organic layeron the substrate.
 3. The method of claim 1 wherein step b) includes thesteps of: i) constructing the structure from a material selected fromthe group consisting of metals, glass, quartz, graphite and ceramics;ii) forming the plurality of nozzles in the structure as nozzlesdefining a circular outline or a polygonal outline; and iii) spacing thenozzles from each other corresponding to a first color-forming patternof a first organic light-emitting layer to be deposited on the OLEDdisplay substrate.
 4. The method of claim 3 wherein step ii) includesthe step of forming the plurality of nozzles in the structure with anozzle inside dimension in a range from 10 to 1000 micrometer, and anozzle length dimension extending through the structure which is atleast 5 times larger than a selected nozzle inside dimension.
 5. Themethod of claim 4 further including forming the plurality of nozzles ina plate structure or in a tubular structure.
 6. The method of claim 4further including forming the plurality of nozzles in the structurealong a single center line, and providing relative motion between theOLED display substrate and the manifold during deposition of acolor-forming stripe pattern of an organic light-emitting layer on thesubstrate.
 7. The method of claim 4 further including forming theplurality of nozzles in the structure as a two-dimensional array ofnozzles in correspondence with selected pixel locations on the OLEDdisplay substrate for providing a pixelated pattern of an organiclight-emitting layer on the selected pixel locations of the substrate.8. The method of claim 1 wherein step a) includes spacing the OLEDdisplay substrate from at least one surface of the structure by adistance from 0.02 to 2.0 centimeter.
 9. The method of claim 1 whereinstep d) includes the steps of: i) providing at least first and secondvapor sources disposed outside of the chamber; ii) connecting each ofthe vapor sources to the manifold; iii) charging the first vapor sourcewith at least one vaporizable organic host material, and charging thesecond vapor source with at least one vaporizable organic dopantmaterial selected to cause emission of one of red, green, or blue lightfrom a pattern of an organic light-emitting layer of an operative OLEDdisplay; and iv) controllably heating the first and second vapor sourcesto a vaporization temperature which causes at least portions of theorganic materials charged into the vapor sources to vaporize, anddelivering such vaporized organic materials from the vapor sourcesthrough respectively corresponding connections into the manifold. 10.The method of claim 9 further including heating surfaces of the vaporsources, surfaces of the connections, and surfaces of the manifold andthe structure to a temperature sufficient to prevent condensation oforganic material vapors on such surfaces.
 11. The method of claim 9further including controlling the delivering of vaporized organicmaterials into the manifold so that a selected vapor pressure ofvaporized organic materials is provided in the manifold.
 12. The methodof claim 1 further including the steps of: i) providing a source ofinert gas; ii) preheating the inert gas to a temperature sufficient toprevent condensation of vaporized organic materials in the manifold andin the nozzles of the structure; iii) controlling the pressure of thepreheated inert gas or controlling the flow of the preheated inert gas;and iv) applying the preheated and controlled inert gas into themanifold.
 13. The method of claim 12 further including controlling thepressure or the flow of the preheated inert gas.
 14. A method ofdepositing in a pattern an organic layer onto an OLED display substrate,comprising the steps of: a) providing a manifold and an OLED displaysubstrate in a chamber at reduced pressure and spaced relative to eachother; b) providing a structure sealingly covering at least one surfaceof the manifold, the structure including a plurality of nozzlesextending through the structure into the manifold, and the nozzles beingspaced from each other in correspondence with the pattern to bedeposited onto the OLED display substrate; c) orienting the OLED displaysubstrate with respect to the nozzles in the structure; d) deliveringtwo vaporized organic host materials and one or more vaporized organicdopant materials into the manifold to provide a selected vapor pressureof such vaporized organic materials in the manifold; and e) applying aninert gas into the manifold under pressure selected to be higher in themanifold than the selected vapor pressure of vaporized organic materialsin the manifold so that the inert gas provides a viscous gas flowthrough each of the nozzles, such viscous gas flow transporting at leastportions of the vaporized organic materials from the manifold throughthe nozzles to provide directed beams of the inert gas and of thevaporized organic materials and projecting the directed beams onto theOLED display substrate for depositing a pattern of a doped organic layeron selected locations of the substrate.
 15. The method of claim 14wherein step b) includes the steps of: i) constructing the structurefrom a material selected from the group consisting of metals, glass,quartz, graphite and ceramics; ii) forming the plurality of nozzles inthe structure as nozzles defining a circular outline or a polygonaloutline; and iii) spacing the nozzles from each other corresponding to afirst color-forming pattern of a first organic light-emitting layer tobe deposited on the OLED display substrate.
 16. The method of claim 15wherein step ii) includes the step of forming the plurality of nozzlesin the structure with a nozzle inside dimension in a range from 10 to1000 micrometer, and a nozzle length dimension extending through thestructure which is at least 5 times larger than a selected nozzle insidedimension.
 17. The method of claim 16 further including forming theplurality of nozzles in a plate structure or in a tubular structure. 18.The method of claim 16 further including forming the plurality ofnozzles in the structure along a single center line, and providingrelative motion between the OLED display substrate and the manifoldduring deposition of a color-forming stripe pattern of an organiclight-emitting layer on the substrate.
 19. The method of claim 16further including forming the plurality of nozzles in the structure as atwo-dimensional array of nozzles in correspondence with selected pixellocations on the OLED display substrate for providing a pixelatedpattern of an organic light-emitting layer on the selected pixellocations of the substrate.
 20. The method of claim 14 wherein step a)includes spacing the OLED display substrate from at least one surface ofthe manifold by a distance from 0.02 to 2.0 centimeter.
 21. The methodof claim 14 wherein step d) includes the steps of: i) providing aplurality of vapor sources disposed outside of the chamber; ii)connecting each one of the plurality of vapor sources to the manifold;iii) charging a first vapor source with a first vaporizable organic hostmaterial, charging a second vapor source with a second vaporizableorganic host material, and charging a third vapor source with one ormore vaporizable organic dopant materials selected to cause emission ofone of red, green, or blue light from a pattern of a doped organiclight-emitting layer of an operative OLED display; and iv) controllablyheating each one of the plurality of vapor sources to a vaporizationtemperature which causes at least portions of the organic materialscharged into each one of the plurality of vapor sources to vaporize, anddelivering such vaporized first and second organic host materials andsuch vaporized one or more organic dopant materials from the respectivevapor sources through respectively corresponding connections into themanifold.
 22. The method of claim 21 further including heating surfacesof the vapor sources, surfaces of the connections, and surfaces of themanifold and the structure to a temperature sufficient to preventcondensation of organic material vapors on such surfaces.
 23. The methodof claim 21 further including controlling the delivering of thevaporized first and second organic host materials and of the one or morevaporized organic dopant materials into the manifold so that a selectedvapor pressure of such vaporized organic materials is provided in themanifold.
 24. The method of claim 14 further including the steps of: i)providing a source of inert gas; ii) preheating the inert gas to atemperature sufficient to prevent condensation of vaporized organicmaterials in the manifold and in the nozzles of the structure; iii)controlling the pressure of the preheated inert gas or controlling theflow of the preheated inert gas; and iv) applying the preheated andcontrolled inert gas into the manifold.
 25. A method of depositing in athree-color pattern organic light-emitting layers onto an OLED displaysubstrate, comprising the steps of: a) providing a manifold and an OLEDdisplay substrate in a chamber at reduced pressure and spaced relativeto each other; b) providing a structure sealingly covering at least onesurface of the manifold, the structure including a plurality of nozzlesextending through the structure into the manifold, and the nozzles beingspaced from each other in correspondence with the pattern to bedeposited onto the OLED display substrate; c) orienting the OLED displaysubstrate with respect to the nozzles in the structure in correspondencewith a first-color pattern of a first organic light-emitting layer to bedeposited on the substrate; d) delivering first-color forming vaporizedorganic light-emitting materials into the manifold; e) applying an inertgas under pressure into the manifold so that the inert gas provides aviscous gas flow through each of the nozzles, such viscous gas flowtransporting at least portions of the first-color forming vaporizedorganic light-emitting materials from the manifold through the nozzlesto provide directed beams of the inert gas and of the first-colorforming vaporized organic light-emitting materials and projecting thedirected beams onto the OLED display substrate for depositing afirst-color pattern of the first organic light-emitting layer on thesubstrate; f) reorienting the OLED display substrate with respect to thenozzles in the structure in correspondence with a second-color patternof a second organic light-emitting layer to be deposited on thesubstrate; g) delivering second-color forming vaporized organiclight-emitting materials into the manifold; h) applying an inert gasunder pressure into the manifold so that the inert gas provides aviscous gas flow through each of the nozzles, such viscous gas flowtransporting at least portions of the second-color forming vaporizedorganic light-emitting materials from the manifold through the nozzlesto provide directed beams of the inert gas and of the second-colorforming vaporized organic light-emitting materials and projecting thedirected beams onto the OLED display substrate for depositing asecond-color pattern of the second organic light-emitting layer on thesubstrate; i) reorienting the OLED display substrate with respect to thenozzles in the structure in correspondence with a third-color pattern ofa third organic light-emitting layer to be deposited on the substrate;j) delivering third-color forming vaporized organic light-emittingmaterials into the manifold; and k) applying an inert gas under pressureinto the manifold so that the inert gas provides a viscous gas flowthrough each of the nozzles, such viscous gas flow transporting at leastportions of the third-color forming vaporized organic light-emittingmaterials from the manifold through the nozzles to provide directedbeams of the inert gas and of the third-color forming vaporized organiclight-emitting materials and projecting the directed beams onto the OLEDdisplay substrate for depositing a third-color pattern of the thirdorganic light-emitting layer on the substrate.
 26. The method of claim25 wherein step b) includes the steps of: i) constructing the structurefrom a material selected from the group consisting of metals, glass,quartz, graphite and ceramics; ii) forming the plurality of nozzles inthe structure as nozzles defining a circular outline or a polygonaloutline; and iii) spacing the nozzles from each other corresponding toequal spacings between the first-color pattern and the second-colorpattern, and between the second-color pattern and the third-colorpattern to provide equally spaced first, second, and third organiclight-emitting layers, respectively, on the OLED display substrate. 27.The method of claim 26 wherein step ii) includes the step of forming theplurality of nozzles in the structure with a nozzle inside dimension ina range from 10 to 1000 micrometer, and a nozzle length dimensionextending through the structure which is at least 5 times larger than aselected nozzle inside dimension.
 28. The method of claim 27 furtherincluding forming the plurality of nozzles in a plate structure or in atubular structure.
 29. The method of claim 27 further including formingthe plurality of nozzles in the structure along a single center line,and providing relative motion between the OLED display substrate and themanifold during deposition of three-color stripe patterns of the first,second, and third organic light-emitting layers, respectively, on thesubstrate.
 30. The method of claim 27 further including forming theplurality of nozzles in the structure as a two-dimensional array ofnozzles in correspondence with pixel locations on the OLED displaysubstrate for providing pixelated patterns of the first, second, andthird organic light-emitting layers, respectively, in correspondingpixel locations on the substrate.
 31. The method of claim 25 furtherincluding forming the plurality of nozzles in the structure as atwo-dimensional array of nozzles in correspondence with selected pixellocations on the OLED display substrate for providing a pixelatedpattern of an organic light-emitting layer on the selected pixellocations of the substrate.
 32. The method of claim 25 wherein steps d),g), and j) include the steps of: i) providing at least four vaporsources disposed outside of the chamber; ii) connecting each of thevapor sources to the manifold; iii) charging a first vapor source withat least one vaporizable organic host material, charging a second vaporsource with at least one vaporizable first-color forming organic dopantmaterial, charging a third vapor source with at least one vaporizablesecond-color forming organic dopant material, and charging a fourthvapor source with at least one vaporizable third-color forming organicdopant material; and iv) controllably heating the first and, insequence, one of the second, third, or fourth vapor sources to avaporization temperature which causes at least portions of the organicmaterials charged into the vapor sources to vaporize, and deliveringsuch vaporized organic materials from the vapor sources throughrespectively corresponding connections into the manifold.
 33. The methodof claim 32 further including heating surfaces of the vapor sources,surfaces of the connections, and surfaces of the manifold and thestructure to a temperature sufficient to prevent condensation of organicmaterial vapors on such surfaces.
 34. The method of claim 32 furtherincluding selecting the first-color forming, second-color forming, andthird-color forming organic dopant materials to cause emission of red,green, and blue light, respectively, from respectively correspondingpatterns of doped organic light-emitting layers of an operative OLEDdisplay.
 35. The method of claim 32 further including controlling thedelivering of vaporized organic light-emitting materials into themanifold so that a selected vapor pressure of vaporized organicmaterials is provided in the manifold.
 36. The method of claim 25further including the steps of: i) providing a source of inert gas; ii)preheating the inert gas to a temperature sufficient to preventcondensation of vaporized organic materials in the manifold and in thenozzles of the structure; iii) controlling the pressure of the preheatedinert gas or controlling the flow of the preheated inert gas; and iv)applying the preheated and controlled inert gas into the manifold. 37.The method of claim 36 further including controlling the pressure or theflow of the preheated inert gas so that a pressure of the preheatedinert gas in the manifold is higher than a vapor pressure of vaporizedorganic materials delivered into the manifold.
 38. A method ofconcurrently depositing in a three-color pattern organic light-emittinglayers onto an OLED display substrate, comprising the steps of: a)providing a manifold assembly and an OLED display substrate in a chamberat reduced pressure and spaced relative to each other, the manifoldassembly including a first manifold, a second manifold, and a thirdmanifold; b) providing a separate structure sealingly covering at leastone surface of each one of the first, second, and third manifolds, eachseparate structure including a plurality of nozzles extending througheach structure into a corresponding manifold, and the nozzles in eachseparate structure being spaced from each other in correspondence withthe three-color pattern to be deposited onto the OLED display substrate;c) orienting the OLED display substrate with respect to the nozzles inone of the separate structures; d) delivering concurrently first-colorforming vaporized organic light-emitting materials into the firstmanifold, second-color forming vaporized organic light-emittingmaterials into the second manifold, and third-color forming vaporizedorganic light-emitting materials into the third manifold assembly; ande) applying an inert gas under pressure concurrently into each one ofthe first, second, and third manifolds so that the inert gas provides aviscous gas flow through each of the plurality of nozzles in each of theseparate structures, such viscous gas flow transporting concurrently atleast portions of the first-color forming, second-color forming, andthird-color forming vaporized organic light-emitting materials from arespectively corresponding manifold through corresponding nozzles toprovide directed beams of the inert gas and of the first-color forming,second-color forming, and third-color forming vaporized organiclight-emitting materials and projecting the directed beams onto the OLEDdisplay substrate for concurrently depositing a three-color pattern onthe substrate.
 39. The method of claim 38 wherein step b) includes thesteps of: i) constructing each structure from a material selected fromthe group consisting of metals, glass, quartz, and ceramics; and ii)forming the plurality of nozzles in each structure as nozzles defining acircular outline or a polygonal outline.
 40. The method of claim 39wherein step ii) includes the step of forming the plurality of nozzlesin each structure with a nozzle inside dimension in a range from 10 to1000 micrometer, and a nozzle length dimension extending through thestructure which is at least 5 times larger than a selected nozzle insidedimension.
 41. The method of claim 40 further including forming theplurality of nozzles in each structure along a single center line, andproviding relative motion between the OLED display substrate and themanifold assembly during concurrent deposition of three-color stripepatterns of organic light-emitting layers on the substrate.
 42. Themethod of claim 38 wherein step d) includes the steps of: i) providingat least four vapor sources disposed outside of the chamber; ii)connecting a first and second vapor source to the first manifold of themanifold assembly, connecting the first and a third vapor source to thesecond manifold of the manifold assembly, and connecting the first and afourth vapor source to the third manifold of the manifold assembly; iii)charging the first vapor source with at least one vaporizable organichost material, charging the second vapor source with at least onevaporizable first-color forming organic dopant material, charging thethird vapor source with at least one vaporizable second-color formingorganic dopant material, and charging the fourth vapor source with atleast one vaporizable third-color forming organic dopant material; andiv) controllably heating the first, second, third, and fourth vaporsources to a vaporization temperature which causes at least portions ofthe organic materials charged into the vapor sources to vaporize, anddelivering such vaporized organic light-emitting materials from thevapor sources through a respectively corresponding connection into acorresponding manifold of the manifold assembly.
 43. The method of claim42 further including heating surfaces of the vapor sources, surfaces ofthe connections, and surfaces of the manifolds and the structures to atemperature sufficient to prevent condensation of organic materialvapors on such surfaces.
 44. The method of claim 42 further includingselecting the first-color forming, second-color forming, and third-colorforming organic dopant materials to cause emission of red, green, andblue light, respectively, from respectively corresponding patterns ofdoped organic light-emitting layers of an operative OLED display. 45.The method of claim 42 further including controlling the delivering ofvaporized organic light-emitting materials into each manifold so that aselected vapor pressure of vaporized organic light-emitting materials isprovided in each manifold.
 46. The method of claim 38 further includingthe steps of: i) providing a source of inert gas; ii) preheating theinert gas to a temperature sufficient to prevent condensation ofvaporized organic materials in each of the manifolds and in the nozzlesof each of the separate structures; iii) controlling the pressure of thepreheated inert gas or controlling the flow of the preheated inert gas;and iv) applying the preheated and controlled inert gas into each of themanifolds of the manifold assembly.
 47. The method of claim 46 furtherincluding controlling the pressure or the flow of the preheated inertgas so that a pressure of the preheated inert gas in each of themanifolds is higher than a vapor pressure of vaporized organic materialsdelivered into each manifold.
 48. A method of depositing in a patternvaporized material onto a surface, comprising the steps of: a) providingvaporized material in a manifold of reduced pressure; b) providing astructure sealingly covering at least one surface of the manifold, thestructure including a plurality of nozzles extending through thestructure into the manifold, and the nozzles being spaced from eachother in correspondence with the pattern to be deposited onto thesurface; and c) applying an inert gas under pressure into the manifoldso that the inert gas provides a viscous gas flow through each of thenozzles, such viscous gas flow transporting at least portions of thevaporized material from the manifold through the nozzles to providedirected beams of the inert gas and of the vaporized material andprojecting the directed beams onto the surface.
 49. The method of claim48 wherein the nozzles are arranged in a pattern which corresponds to apattern of the directed beams so that the vaporized material isdeposited in accordance with such pattern.
 50. The method of claim 49wherein step b) includes the steps of: i) constructing the structurefrom a material selected from the group consisting of metals, glass,quartz, and ceramics; ii) forming the plurality of nozzles in thestructure as nozzles defining a circular outline or a polygonal outline;and iii) spacing the nozzles from each other corresponding to a firstcolor-forming pattern of a first organic light-emitting layer to bedeposited on the OLED display substrate.
 51. The method of claim 50wherein step ii) includes the step of forming the plurality of nozzlesin the structure with a nozzle inside dimension in a range from 10 to1000 micrometers, and a nozzle length dimension extending through thestructure which is at least 5 times larger than a selected nozzle insidedimension.
 52. The method of claim 51 further including forming theplurality of nozzles in a plate structure or in a tubular structure. 53.A method of simultaneously depositing in a pattern an organiclight-emitting layer onto an OLED display substrate, comprising: a)providing a plurality of manifolds relative to an OLED substrate in achamber at reduced pressure and spaced relative to each other; b)providing a structure sealingly covering at least one surface of each ofthe manifolds, the structure including a plurality of nozzles extendingthrough the structure into the manifold, and the nozzles being spacedfrom each other in correspondence with the pattern to be deposited ontothe OLED display substrate; c) providing different vaporized organicmaterials into each manifold; and e) applying an inert gas underpressure into the manifolds so that the inert gas provides a viscous gasflow through each of the nozzles, such viscous gas flow transporting atleast portions of the vaporized organic light-emitting materials fromthe manifolds through the nozzles to provide directed beams of the inertgas and of the vaporized organic light-emitting materials and projectingthe directed beams onto the OLED display substrate for depositing apattern of an organic light-emitting layer on the substrate.